IEDM is THE device conference with more than a thousand participants from major companies and R&D institutes. Many talks were dedicated to new memory devices and circuits, including Ferroelectrics, MRAM, RRAM, driven by the requirements of AI processing. EUV is definitely there for 3nm and beyond. 3D integration was shown for LP-HP logic and RF. Gate-All-Around devices, with nanowires or nanosheets are mature versus FinFET.
CMOS: Mixed-Signal Circuit Design, Second Edition R. Jacob Baker. Published Wiley-IEEE Press, 2nd Edition. Pub […]
本ウェビナーでは、自動車のサイバー・フィジカル・システム (Cyber-Physical System) のリスクについて、そしてシステムを保護するために必要な対策について説明します。
At our SURGE Santa Clara event in October, Cameron Fisher, CEO of Mobile Semiconductor described their experience in adopting SmartSpice as their characterization engine for creating the database for their Trailblaze™ memory compiler software. Below is a summary of his talk.
The IEEE International Electron Devices Meeting (IEDM) is the world’s preeminent forum for reporting technological breakthroughs in the areas of semiconductor and electronic device technology, design, manufacturing, physics, and modeling. It is the flagship conference for
Nanometer-scale CMOS transistor technology, advanced memory, displays, sensors, MEMS devices
Novel quantum and nano-scale devices and phenomenology
Optoelectronics, devices for power and energy harvesting, high-speed devices
Process technology and device modeling and simulation
本ウェビナーでは、人工知能 (AI) およびマシン・ラーニング (ML) のSoCを開発する上での課題について考察します。
Abstract— A complete simulation flow for a Nanowire-based ring oscillator circuit is presented, where the active devices were simulated using an atomistic device simulator. The results of this simulation have been fitted to an active device SPICE compact model, specifically formulated for nanowire/Gate all around Field Effect Transistors” (FETs). Finally, the active devices were incorporated into a SPICE netlist including back end resistance and capacitance parasitics.
Abstract—There are several device challenges unique to the select gate transistor in 3D NAND memory cell. It requires low leakage current to prevent read and program disturb problems and it needs to provide enough current during read and erase operation. In this paper, we examined the design optimization of select gate transistor with respect to various device elements including work-function, S/D overlap, and trap density. Finally, we reviewed the path to reduce the channel length of the select gate transistor in conjunction with the role of dummy cells.
In this paper, in order to understand trap-rich substrate behavior, passive and active device on SOI with trap-rich layer structures were simulated using the Victory Device simulator. Harmonics distortion of devices were also compared.
Introduction
Diamond is considered to be the ultimate semiconductor material for high power and high frequency devices due to its superior electrical and thermal properties, such as high breakdown field, high carrier mobility, low dielectric constant, and high thermal conductivity, as shown in Table 1.
Furthermore, diamond has some unique electronic properties. The surface of diamond films terminated by hydrogen atoms has negative electron affinity (NEA) and can generate a two-dimensional hole accumulation layer suitable as a hole channel of a field-effect transistor.