エントリー - Gigi Boss

Learn How TCAD is a Key Enabler for Photodiode Development

2023年2月24日
本ウェビナーでは、シルバコがこれらの技術について解説し、TCADが様々な光検出器の構造と材料の組合せに対して幅広く適用されており、エンドユーザ市場に貢献していることを説明します。

3D TCAD Simulation of Gallium Nitride Tri-gate Junction HEMT

The GaN high electron mobility transistor (HEMT) has been commercialized as a power device with performance superior to Si devices in the voltage classes from 15 V to 900 V [1]. Most of commercial enhancement-mode (E-mode) HEMTs comprise a planar p-GaN gate. Recently, 3-D gate stacks, such as FinFET and tri-gate structures, have been introduced to lateral GaN HEMTs. They can realize superior gate controllability and E-mode operation with a higher current on/off ratio and lower gated channel resistance [2].

Writing an Impurity Activation Model with the Open Model Library

Accuracy of Impurity Activation is essential in correctly modeling and simulating Silicon Carbide devices. For high concentrations of dopants, it is well known that less than 100% of dopants will be electrically active. To address this effect, Silvaco Victory Process models dopant activation in Silicon Carbide in 3 ways.

User Probes and Arbitrary Parameter Sweeps in Victory Device

One of the new features in Victory Device is the ability to add user managed parameters to a log file. This can be used when sweeping parameters (manually or in a Deckbuild loop), such as doping, stress, or layer thicknesses, to add the swept parameter to a log file. To do so, simply create a USER probe (with an optional name), and set the parameter USER on the MODELS statement to some value. This parameter (and value) will be added to the log file. The available user parameters are USER1, USER2, USER3, and USER4. The following shows a DeckBuild loop (go victoryd) to simulate the effect of varying STRESS_XX on the mobility.

Learn About Victory Visual, Silvaco’s New Graphical Visualization Solution for TCAD

2022年9月23日 | 2:00-2:30 JST
本ウェビナーでは、シルバコのTCAD可視化ツールの最新世代であるVictory Visualの機能を順を追って説明します。本ウェビナーは、Victory Visualの主要な機能を理解するためのハウツーガイドであると同時に、Victory AtomisticおよびVictory Mesh – Solid Modeling向けの機能についても簡単に紹介することを目的としています。これまでのシルバコTCADツールのユーザおよび新しいユーザの視点から、多くの質問を取り上げます。

Quantum Transport Simulation at Atomistic Accuracy of a Nanowire FET

The FET physical dimensions continue to shrink to five nm node and below, characterized by new types of architectures with nanosheet (NS) and nanowire (NW) shapes [3]. The present choice of material is made of Si, Ge, or SiGe alloy thanks to their high carrier concentrations. In compliment to III-V technology envisaged for a while, new 2D materials are also investigated (for example, the TMDs monolayers1). Such nanomaterials and nano-architectures require atomistic simulations for at least two crucial reasons: 1) bulk parameters like the effective masses and forbidden bandgap are no longer pertinent quantities, and 2) the wave nature of charge carriers becomes predominant for predicting transport characteristics including scattering events.