How TCAD Can Help You to Find The Right Material To Build Your Flexible Display
The mechanical stress in a thin-film transistor on flexible substrate is one of the most important problem in the display industry. It causes to change electrical performance when bending, stretching or when repeated deformation is performed to the device under test. We will review numerical methods used for stress simulation and compare to analytical model on simple structure and present our non-linear finite element approach for deformation induced stress. This unique simulation flow allows calculation of large deformation field and associated stress and strain on flexible electronics
What attendees will learn:
- A brief review of non-linear finite element method
- Key challenges of a general approach for deformation induced stress
- Bending deformation stress for thin film transistor on flexible substrate
- Verification of the simulation results
Presenter
Sungwon Kong is senior TCAD application engineer working in Silvaco US. He has been supporting TCAD application in display area at Silvaco Korea since 1996. He graduated from Inha Universtity in electrical materials and device engineering and worked Samsung Electronics at Gi-heung, Kung-gi-do before joining Silvaco.
Dr. Heetaek Lim is senior development engineer at Silvaco’s TCAD Division. He is mainly responsible for Victory Stress development. Prior to joining Silvaco, Dr. Lim was a development engineer at MSC Software Corporation.
Dr. Lim holds a Ph.D in computational mechanics from UC Berkeley.
When: May 17, 2018
Where: Online
Time: 10:00am-11:00am-(PST)
Language: English
WHO SHOULD ATTEND:
Academics, engineers and management looking for solutions to design and optimize the thin film transistor on flexible substrate which minimize stress related issues.