エントリー - Ingrid Schwarz

An Empirical Composition Dependent Model of Dopant Diffusion Coefficients in Si, Si1-x Gex and Ge Material Systems

Previously published fast empirical models for diffusion coefficients in silicon-germanium (Si1-x Gex) [1][2] were not applicable to high germanium content x≥0.5 and hence did not properly extend towards germanium. For some dopants, diffusion coefficients become very small and hence this model cannot be applied to devices containing silicon-germanium with high germanium content or devices containing silicon, silicon-germanium and germanium

TCAD Simulation of Leakage Through Threading Dislocations in GaN-based pn-diodes

Gallium nitride (GaN)-based devices for power electronics show superior performance in comparison to silicon carbide and silicon-based devices [1]–[3]. The development of vertical devices, like pn-diodes and power HEMTs results in higher power density and voltage handling. One of the key parameters of this technology is the dislocation density. This is lower in free-standing GaN-on-GaN epitaxy than in heteroepitaxial GaN growth on different substrates like SiC or Si, but still has a density of 104-106 cm-2 [4]. The diode reverse leakage seems to be related to the dislocation density, and it can be modelled with a Poole-Frenkel or a hopping conduction mechanism [5]. The Poole-Frenkel model is already implemented in the trap-assisted tunnelling model in Silvaco Atlas [6]. For the leakage in threading dislocations a variable-range hopping (VRH) model has been implemented in the simulator, based on Ref. [7].

Hints, Tips and Solutions – DeckBuild Remote VM Setup

This document describes how to setup a virtual environment suitable for the deckbuild remote mode.
The host system to consider shall be Windows (7 or 10). The goal is to use the windows version of the TCAD GUI tools TonyPlot and DeckBuild and to run any simulation (Victory, Athena, Clever) on a Linux Virtual Machine (VM).

TCAD入門―デバイス理論の実践

本ウェビナーでは、著名なゲスト講演者、アリゾナ州立大学、電気電子情報工学の教授、Hugh Barnaby博士をお招きします。シルバコTCADの概要について学ぶことができ、また半導体デバイス物理の学習の一環として、効率的かつ効果的にTCADを利用する方法、および物理ベース・モデリングを用いて新技術を調査、設計するツールとしてTCADを導入する方法について、Barnaby博士の考えを聴くことができます。

エンタープライズ・レベルのIP管理を実現

本ウェビナーでは、現在の半導体企業が直面する問題と、半導体企業がデザイン・データだけでなく技術とは関係ない大量のメタデータ、そして社内および社外IPをエンタープライズ・レベルで体系化するのに役立つシルバコのテクノロジについて考察します。

TCAD Simulation of Si and GaAs p-n Junction Devices at Cryogenic Temperatures, Down to 2 K

Cryogenic electronics plays a fundamental role in several applications, such as spacecraft, high-energy physics experiments, metrology, superconductive astronomical detectors and, with the increased interest in quantum computing, the manipulation of quantum bits (qubits) [1]. Outstanding characteristics have been reported for advanced CMOS technologies operating at cryogenic temperature in terms of on-state current, leakage current, subthreshold swing, and transconductance [2]. This represents an excellent opportunity to use such advanced technologies to design and implement a quantum computing control system (including multiplexers, LNAs, and RF oscillators) and introduce it inside the refrigerator together with the qubits [3]. Another recently growing field of application is the cryogenic silicon photonics [4].