Trajectory Replication in Monte Carlo Ion Implantation with Victory Process
Introduction
Monte Carlo ion implantation in Victory Process is an important tool for process simulations of solid structures to achieve physically accurate concentration profiles. The Monte Carlo algorithm simulates the paths of particles entering the simulation domain from an implantation window into the structure defined by the user. The atoms then move through the structure, losing energy as they interact with the material, until they stop or are backscattered. To achieve results that show low statistical variations and continuous (or smooth) concentration profiles often requires a significant amount of computing time. The goal of trajectory replication is to provide a means of reducing the overall computation time with equally smooth concentration profiles, by replicating or copying the paths of the ions from one part of the structure to another. To achieve physically accurate results the copying must be performed given well defined conditions, which is outlined in this article. Before more details of the replication procedure are introduced, some important concepts in the Monte Carlo ion implantation procedure will be discussed.
