• 技术刊物 Simulation Standard

Simulation Standard

Silvaco面向半导体工艺和器件仿真工程师推出的技术刊物

PHILIPS Model 9 New MM9 Extraction Routine in UTMOST III

Philips Level 9 model is widely used as an accurate deep submicron CMOS model. The model is physical, and as such lands itself to accurate extraction methodologies.

HINTS & TIPS – December 1998

Q: I took the example file mux4.gds from Expert's installation and tried the Edit-in-place operation. I entered into an instance of mux1, modified a box in it and exited from EIP. There are options to change the edited cell and to save instance under another cell name.

LISA Powerful Script language for Expert

This article introduces the LISA (Language for Interfacing Silvaco Applications) command language and gives an overview of LISA features.

Expert Expanded with Client-Server Project/Library Management

The Expert layout processor v.2.0 introduces a client-server system for managing large projects in multiuser design environments. This system is a significant improvement and enhances productivity by providing concurrent access to the same design data by several designers while maintaining data integrity and ensuring security for intellectual property.

HINTS & TIPS – November 1998

Q: How can anti-reflective coatings be modeled when simulating photodetectors in ATLAS/Luminous? How can detection efficiency be plotted?A: Earlier version of ATLAS were able to handle refraction and reflection of rays during the optical simulation in Luminous.

New Model for High Energy Implants in ATHENA

In our earlier paper [1] a new Binary Collision Approximation (BCA) module was described. It was shown that models and algorithms implemented into the BCA model allow to accurately predict implant profiles with significant channeling as well as the dose and screen oxide thickness dependencies for relatively low implant energies.