{"id":42380,"date":"2022-07-08T15:53:19","date_gmt":"2022-07-08T22:53:19","guid":{"rendered":"https:\/\/silvaco.com\/%e6%9c%aa%e5%88%86%e7%b1%bb\/learn-how-to-efficiently-achieve-accurate-experimental-etch-profiles-in-finfet-and-memory-applications-with-victory-process\/"},"modified":"2026-10-02T07:00:57","modified_gmt":"2026-10-02T14:00:57","slug":"experimental-etch-profiles-finfet","status":"publish","type":"post","link":"https:\/\/silvaco.com\/zh-hans\/tcad-zh-hans\/tcad-webinars-zh-hans\/experimental-etch-profiles-finfet\/","title":{"rendered":"Learn How to Efficiently Achieve Accurate Experimental Etch Profiles in FinFET and Memory Applications with Victory TCAD Solution"},"content":{"rendered":"<p><img fetchpriority=\"high\" decoding=\"async\" class=\"cleaned-enfold-image\" src=\"https:\/\/silvaco.com\/wp-content\/uploads\/2018\/12\/Webinar.jpg\" sizes=\"auto, (max-width: 1920px) 100vw, 1920px\" srcset=\"https:\/\/silvaco.com\/wp-content\/uploads\/2018\/12\/Webinar.jpg 1920w, https:\/\/silvaco.com\/wp-content\/uploads\/2018\/12\/Webinar-300x31.jpg 300w, https:\/\/silvaco.com\/wp-content\/uploads\/2018\/12\/Webinar-1030x108.jpg 1030w, https:\/\/silvaco.com\/wp-content\/uploads\/2018\/12\/Webinar-768x80.jpg 768w, https:\/\/silvaco.com\/wp-content\/uploads\/2018\/12\/Webinar-1536x161.jpg 1536w, https:\/\/silvaco.com\/wp-content\/uploads\/2018\/12\/Webinar-1500x157.jpg 1500w, https:\/\/silvaco.com\/wp-content\/uploads\/2018\/12\/Webinar-705x74.jpg 705w, https:\/\/silvaco.com\/wp-content\/uploads\/2018\/12\/Webinar-43x5.jpg 43w, https:\/\/silvaco.com\/wp-content\/uploads\/2018\/12\/Webinar-63x7.jpg 63w, https:\/\/silvaco.com\/wp-content\/uploads\/2018\/12\/Webinar-48x5.jpg 48w\" alt=\"Banner Blue\" width=\"1920\" height=\"201\" \/><\/p>\n<h1>Learn How to Efficiently Achieve Accurate Experimental Etch Profiles in FinFET and Memory Applications with Victory TCAD Solution<\/h1>\n<p><img decoding=\"async\" class=\" wp-image-42118 alignright\" src=\"https:\/\/silvaco.com\/wp-content\/uploads\/2022\/07\/Webinar-11-Aug-300x151.jpg\" alt=\"Aug 11 webinar image\" width=\"280\" height=\"141\" srcset=\"https:\/\/silvaco.com\/wp-content\/uploads\/2022\/07\/Webinar-11-Aug-300x151.jpg 300w, https:\/\/silvaco.com\/wp-content\/uploads\/2022\/07\/Webinar-11-Aug-1030x518.jpg 1030w, https:\/\/silvaco.com\/wp-content\/uploads\/2022\/07\/Webinar-11-Aug-768x386.jpg 768w, https:\/\/silvaco.com\/wp-content\/uploads\/2022\/07\/Webinar-11-Aug-705x354.jpg 705w, https:\/\/silvaco.com\/wp-content\/uploads\/2022\/07\/Webinar-11-Aug-43x22.jpg 43w, https:\/\/silvaco.com\/wp-content\/uploads\/2022\/07\/Webinar-11-Aug-63x32.jpg 63w, https:\/\/silvaco.com\/wp-content\/uploads\/2022\/07\/Webinar-11-Aug-48x24.jpg 48w, https:\/\/silvaco.com\/wp-content\/uploads\/2022\/07\/Webinar-11-Aug.jpg 1327w\" sizes=\"(max-width: 280px) 100vw, 280px\" \/>When employing process simulation to generate a complex device structure, TCAD engineers often face the task of reproducing the exact etch profile that has been observed in semiconductor fabrication. Silvaco Victory Process offers several geometric models to efficiently achieve etch geometries that accurately match microscopy images (e.g., transmission electron microscopy).<\/p>\n<p>In this webinar, we present these geometric etch models in the context of FinFET and memory applications. We demonstrate techniques to realize fin shaping, non-ideal etch profiles (bowing, twisting), and self-aligned processes (multi-patterning).<\/p>\n<h4><strong>What You Will Learn<\/strong><\/h4>\n<ul>\n<li>How to achieve accurate etch profiles as observed on microscopy images<\/li>\n<li>How to efficiently use Silvaco Victory Process to achieve fin shapes in FinFET flows<\/li>\n<li>How apply geometric etch modes for trenches and contact holes in memory applications (3D NAND)<\/li>\n<li>How to use Silvaco Victory Process\u2019s powerful and adaptable ETCH DRY and ETCH POLYLINE commands<\/li>\n<\/ul>\n<h2>Presenter<\/h2>\n<p><img decoding=\"async\" class=\"wp-image-42112 size-full alignleft\" src=\"https:\/\/silvaco.com\/wp-content\/uploads\/2022\/07\/Alexander-Toifl.jpg\" alt=\"Alexander Toifl\" width=\"84\" height=\"103\" srcset=\"https:\/\/silvaco.com\/wp-content\/uploads\/2022\/07\/Alexander-Toifl.jpg 84w, https:\/\/silvaco.com\/wp-content\/uploads\/2022\/07\/Alexander-Toifl-30x37.jpg 30w, https:\/\/silvaco.com\/wp-content\/uploads\/2022\/07\/Alexander-Toifl-45x55.jpg 45w, https:\/\/silvaco.com\/wp-content\/uploads\/2022\/07\/Alexander-Toifl-39x48.jpg 39w\" sizes=\"(max-width: 84px) 100vw, 84px\" \/><strong>Alexander Toifl, Development Engineer, Silvaco TCAD<\/strong> DivisionSince joining Silvaco in 2021, he has worked on etch and deposition models in Victory Process. Alexander Toifl received a doctoral degree in electrical engineering from the University of Technology Vienna (TU Wien), Austria, and a M.S. degree in microelectronics and photonics from the same institution.<\/p>\n<h3>WHO SHOULD ATTEND:<\/h3>\n<p>Engineers and management looking for solutions to efficiently achieve etch profiles in a process TCAD flow.<\/p>\n<p><strong>When<\/strong>: August 11, 2022<br \/>\n<strong>Where<\/strong>: Online<br \/>\n<strong>Time<\/strong>: 10:00am-10:30am-(PDT)<br \/>\n<strong>Language<\/strong>: English<\/p>\n<div style=\"padding: 10px; background-color: #99ccff;\">\n<h1 align=\"center\">Register<!-- to view On-Demand Webinar-->!<\/h1>\n<p><iframe style=\"border: 0;\" src=\"https:\/\/go.silvaco.com\/l\/145371\/2022-07-07\/2zykv8\" width=\"100%\" height=\"500\" frameborder=\"0\"><\/iframe><\/p>\n<\/div>\n","protected":false},"excerpt":{"rendered":"<p><b>August 11, 2022<\/b><br \/>\nIn this webinar, we present these geometric etch models in the context of FinFET and memory applications. We demonstrate techniques to realize fin shaping, non-ideal etch profiles (bowing, twisting), and self-aligned processes (multi-patterning).<\/p>\n","protected":false},"author":8,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"inline_featured_image":false,"footnotes":""},"categories":[7729],"tags":[7716],"class_list":["post-42380","post","type-post","status-publish","format-standard","hentry","category-tcad-webinars-zh-hans","tag-victory-process-zh-hans","entry"],"yoast_head":"<!-- This site is optimized with the Yoast SEO Premium plugin v28.7 (Yoast SEO v28.7) - https:\/\/yoast.com\/product\/yoast-seo-premium-wordpress\/ -->\n<title>Learn How to Efficiently Achieve Accurate Experimental Etch Profiles in FinFET and Memory Applications with Victory TCAD Solution -<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/silvaco.com\/zh-hans\/tcad-zh-hans\/tcad-webinars-zh-hans\/experimental-etch-profiles-finfet\/\" \/>\n<meta property=\"og:locale\" content=\"zh_CN\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Learn How to Efficiently Achieve Accurate Experimental Etch Profiles in FinFET and Memory Applications with Victory TCAD Solution\" \/>\n<meta property=\"og:description\" content=\"August 11, 2022 In this webinar, we present these geometric etch models in the context of FinFET and memory applications. We demonstrate techniques to realize fin shaping, non-ideal etch profiles (bowing, twisting), and self-aligned processes (multi-patterning).\" \/>\n<meta property=\"og:url\" content=\"https:\/\/silvaco.com\/zh-hans\/tcad-zh-hans\/tcad-webinars-zh-hans\/experimental-etch-profiles-finfet\/\" \/>\n<meta property=\"og:site_name\" content=\"Silvaco\" \/>\n<meta property=\"article:publisher\" content=\"https:\/\/www.facebook.com\/SilvacoSoftware\/\" \/>\n<meta property=\"article:published_time\" content=\"2022-07-08T22:53:19+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2026-10-02T14:00:57+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/silvaco.com\/wp-content\/uploads\/2018\/12\/Webinar.jpg\" \/>\n<meta name=\"author\" content=\"Gigi Boss\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:creator\" content=\"@SilvacoSoftware\" \/>\n<meta name=\"twitter:site\" content=\"@SilvacoSoftware\" \/>\n<meta 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