{"id":35835,"date":"2020-02-26T17:52:49","date_gmt":"2020-02-26T17:52:49","guid":{"rendered":"https:\/\/silvaco.com\/%e6%9c%aa%e5%88%86%e7%b1%bb\/tft-technology\/"},"modified":"2026-10-02T08:41:20","modified_gmt":"2026-10-02T15:41:20","slug":"tft-technology","status":"publish","type":"post","link":"https:\/\/silvaco.com\/zh-hans\/tcad-zh-hans\/tcad-published-papers-zh-hans\/tft-technology\/","title":{"rendered":"TFT Technology"},"content":{"rendered":"<h1>TFT Technology<\/h1>\n<p>The full text for most of these papers may be found at the IEEE website at\u00a0<a href=\"http:\/\/www.ieee.org\/\" target=\"_blank\" rel=\"noopener\">www.ieee.org<\/a>.<\/p>\n<div>Yu-Shien Shiah<sup>1,<\/sup>\u00a0Kihyung Sim<sup>1<\/sup>, Yuhao Shi<sup>1<\/sup>, Katsumi Abe<sup>2<\/sup>, Shigenori Ueda<sup>3<\/sup>, Masato Sasase<sup>1<\/sup>, Junghwan Kim<sup>1<\/sup>\u00a0&amp; Hideo Hosono<sup>1,3<\/sup><\/div>\n<div><a title=\"https:\/\/doi.org\/10.1038\/s41928-021-00671-0\" href=\"https:\/\/doi.org\/10.1038\/s41928-021-00671-0\" target=\"_blank\" rel=\"noopener noreferrer\" data-auth=\"NotApplicable\" data-linkindex=\"0\">Mobility\u2013stability trade-off in oxide thin-film transistors<\/a><\/div>\n<ol>\n<li>Materials Research Center for Element Strategy, Tokyo Institute of Technology, Yokohama, Japan<\/li>\n<li>Silvaco Japan, Japan<\/li>\n<li>WPI-MANA, National Institute for Materials Science, Ibaraki, Japan<\/li>\n<\/ol>\n<div>Nature Electronics volume 4, pages800\u2013807 (2021)<\/div>\n<p>Hyeon-Jun Lee<sup>1<\/sup>\u00a0, Katsumi Abe\u00a0<sup>2<\/sup><br \/>\n<a href=\"https:\/\/doi.org\/10.1109\/LED.2020.2986478\" target=\"_blank\" rel=\"noopener\">A Study on the Effect of Pulse Rising and Falling Time on Amorphous Oxide Semiconductor Transistors in Driver Circuits<\/a><\/p>\n<ol>\n<li>Institute of Convergence, Daegu Gyeonbuk Institute of Science and Technology (DGIST), Daegu, South Korea<\/li>\n<li>Silvaco Japan Company, Ltd., Kyoto, Japan<\/li>\n<\/ol>\n<p>IEEE Electron Device Letters, Volume: 41 Issue: 6<\/p>\n<p>Hwarim Im<sup>1<\/sup>, Hyunsoo Song<sup>1<\/sup>, Jaewook Jeong<sup>2<\/sup>, Yewon Hong<sup>1<\/sup>, Yongtaek Hong<sup>1<\/sup>,<br \/>\n&#8220;Effects of the defect creation on the bidirectional shift of threshold voltage with hump characteristics of InGaZnO TFTs Under Bias and Thermal Stress&#8221;<\/p>\n<ol>\n<li>Dept. of Electr. &amp; Comput. Eng., Seoul Nat. Univ., Seoul, South Korea<br \/>\nInter-University Semiconductor Research Center, Seoul Nat. Univ., Seoul, South Korea<\/li>\n<li>Division of Nano and Bio Technology, Daegu Gyeongbuk Institute of Science and Technology,<br \/>\nDaegu, South Korea<\/li>\n<\/ol>\n<p>Active-Matrix Flatpanel Displays and Devices (AM-FPD) 2014, pp.153-156<\/p>\n<p><span class=\"regular\">Copyright 2014 The Japan Society of Applied Physics<\/span><\/p>\n<p>Kimura M., Bundo K., Imuro Y., Sagawa Y., Setsu K.,<br \/>\n&#8220;Chronoamperometry Using Integrated Potentiostat Consisting of Poly-Si Thin-Film Transistors&#8221;<br \/>\nElectron Device Letters, IEEE, Vol. 32, Issue 2, Feb 2011, pp. 212&amp;214<\/p>\n<p>Kasakawa T., Tabata H., Onodera R., Kojima H., Kimura M., Hara H., Inoue S.,<br \/>\n&#8220;An Artificial Neural Network at Device Level Using Simplified Architecture and Thin-Film Transistors&#8221;<br \/>\nIEEE Transactions on Electron Devices, Vol. 57, Issue 10, October 2010, pp. 2744&amp;2750<\/p>\n<p>Aapo Varpula,<br \/>\n&#8220;Modeling of transient electrical characteristics for granular semiconductors&#8221;,<br \/>\nJournal of Applied Physics, Vol. 108, Issue: 3, 2010, pp. 034511&amp;034511-13.<\/p>\n<p>Mutsumi Kimura,<br \/>\n&#8220;Extraction of trap densities in poly-Si thin-film transistors fabricated by solid-phase crystallization and dependence on temperature and time of post annealing&#8221;,<br \/>\nSolid-State Electronics, Vol. 54, Issue 12, December 2010, pp. 1500-1504.<\/p>\n<p>Meng Zhang, Mingxiang Wang,<br \/>\n&#8220;An investigation of drain pulse induced hot carrier degradation in n-type low temperature polycrystalline silicon thin film transistors&#8221;,<br \/>\nMicroelectronics Reliability, Vol. 50, Issue 5, May 2010, pp. 713-716.<\/p>\n<p>Gupta Dipti, Katiyar M., Gupta Deepak,<br \/>\n&#8220;An analysis of the difference in behavior of top and bottom contact organic thin film transistors using device simulation&#8221;,<br \/>\nOrganic Electronics, Vol. 10, Issue 5, August 2009, pp. 775-784<\/p>\n<p>M. G. Ancona, A. Svizhenko,<br \/>\n&#8220;Physics of tunneling from a macroscopic perspective&#8221;,<br \/>\n2008 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD 2008), pp. 361-4, 2008.<\/p>\n<p>A. Jamshidi-Roudbari, P. C. Kuo, M. K. Hatalis,<br \/>\n&#8220;High voltage, moderate current thin film transistor for actuator applications&#8221;,<br \/>\nECS Transactions&amp;Sensor, Actuators, and Microsystems General Session, Vol. 11, Issue 14, 2008, pp. 31-39<\/p>\n<p>Hsiao-Wen Zan, Kuang-Ming Wang,<br \/>\n&#8220;The Channel Length Extension in Poly-Si TFTs With LDD Structure&#8221;,<br \/>\nElectron Device Letters, IEEE Vol. 29, Issue 9, Sept. 2008 pp. 1034&amp;1036.<\/p>\n<p>Kathy Boucart, Adrian Mihai Ionescu,<br \/>\n&#8220;A new definition of threshold voltage in Tunnel FETs&#8221;,<br \/>\nSolid-State Electronics, Vol. 52, Issue 9, September 2008, pp. 1318-1323<\/p>\n<p>Amit Sehgal, Tina Mangla, Mridula Gupta and R.S. Gupta,<br \/>\n&#8220;Multi-material gate poly-crystalline thin film transistors: Modeling and simulation for an improved gate transport efficiency&#8221;,<br \/>\nThin Solid Films, Vol. 516, Issue 8, 29 February 2008, pp. 2162-2170<\/p>\n<p>Domenico Palumbo, Silvia Masala, Paolo Tassini, Alfredo Rubino, and Dario della Sala<br \/>\n&#8220;Electrical Stress Degradation of Small-Grain Polysilicon Thin-Film Transistors&#8221;,<br \/>\nIEEE Transactions on Electron Devices, VOL 54, NO 3, March 2007.<\/p>\n<p>Kiyoshi Harada, Takuto Yoshino, Tohuru Yasuhara, Mutsumi Kimura, Daisuke Abe, Satoshi Inque, and Tatsuya Shimoda,<br \/>\n&#8220;Extraction Technique of Trap Density at Grain Boundaries in Polycrystalline-Silicon Thin-Film Transistors with Device Simulation&#8221;<br \/>\nJapanese Journal of Applied Physics, Vol. 46, No 3B, 2007 pp. 1308-1311<\/p>\n<p>Domenico Palumbo, Silvia Masala, Paolo Tassini, Alfredo Rubino, Dario della Sala,<br \/>\n&#8220;Electrical Stress Degradation of Small-Grain Polysilicon Thin-Film Transistors&#8221;<br \/>\nElectron Devices, IEEE Transactions on Vol. 54, Issue 3, March 2007 pp. 476-482<\/p>\n<p>Ilias Pappas, Stilianos Siskos, Charalabos A. Dimitriadis,<br \/>\n&#8220;A New Analog Buffer Using Low-Temperature Polysilicon Thin-Film Transistors for Active-Matrix Displays&#8221;<br \/>\nElectron Devices, IEEE Transactions on Vol. 54, Issue 2, Feb. 2007 pp. 219-224<\/p>\n<p>M. Kimura, T. Yasuhara, K. Harada, D. Abe, S. Inoue, T. Shimoda,<br \/>\n&#8220;Device simulation of polycrystalline-silicon thin-film transistors with trap states at front and back oxide interfaces&#8221;<br \/>\nKyokai Joho Imeji Zasshi\/Journal of the Institute of Image Information and Television Engineers<\/p>\n<p>M. J. Kumar, S. D. Roy,<br \/>\n&#8220;A new high breakdown voltage lateral Schottky collector bipolar transistor on SOI: Design and analysis&#8221;<br \/>\nIEEE Transactions on Electron Devices, Vol. 52, Issue 11, November 2005, pp. 2496-2501<\/p>\n<p>A. Sehgal, T. Mangla, S. Chopra, M. Gupta, R. S. Gupta,<br \/>\n&#8220;Sub-threshold analysis and drain current modeling of polysilicon thin-film transistor using Green\u00b4s function approach&#8221;<br \/>\nIEEE Transactions on Microwave Theory and Techniques, Vol. 53, Issue 9, pp. 2682-2687<\/p>\n<p>Bawedin M., Cristoloveanu, S., Yun, J.G., Flandre, D.,<br \/>\n&#8220;A new memory effect (MSD) in fully depleted SOI MOSFETs&#8221;<br \/>\nSolid-State Electronics, Vol. 49, Issue 9 SPEC. ISS., September 2005, pp. 1547-1555<\/p>\n<p>F. Balon, J. M. Shannon,<br \/>\n&#8220;Modeling of source-gated transistors in amorphous silicon&#8221;<br \/>\nJournal of the Electrochemical Society, Vol. 152, Issue 8, 2005.<\/p>\n<p>L. Perniola, S. Bernardini, G. Iannaccone, B. De Salvo, G. Ghibaudo, P. Masson, C. Gerardi,<br \/>\n&#8220;Electrostatic effect of localised charge in dual bit memory cells with discrete traps&#8221;<br \/>\nESSCIRC 2004&amp;Proceedings of the 34th European Solid-State Device Research Conference, ESSCIRC 2004, pp. 249-252<\/p>\n<p>Y. D. Hong, Y. T. Yeow, W. -K. Chim, K. -M Wong, J. J. Kopanski,<br \/>\n&#8220;Influence of interface traps and surface mobility degradation on scanning capacitance microscopy measurement&#8221;<br \/>\nIEEE Transactions on Electron Devices, Vol. 51, Issue 9, September 2004, pp. 1496-1503.<\/p>\n<p>S. Sedlmaier, K. K. Bhuwalka, A. Ludsteck, M. Schmidt, J. Schulze, W. Hansch, I. Eisele,<br \/>\n&#8220;Gate-controlled resonant interband tunneling in silicon&#8221;<br \/>\nApplied Physics Letters, Vol. 85, Issue 10, 6 September 2004, pp. 1707-1709.<\/p>\n<p>H. Tango, M. Suganuma, G. Usami, Y. Nogami,<br \/>\n&#8220;Hot-carrier instability in N-And P-channel poly-Si TFTs&#8221;<br \/>\nProceedings&amp;Electrochemical Society, Vol. PV 2004-15, pp. 104-111<\/p>\n<p>Mutsumi Kimura, Daisuke Abe, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Extraction of Trap Densities at Front- and Back-Interfaces in poly-Si TFTs with Plasma Treatment and Vapor Heat Treatment&#8221;<br \/>\nExt. Abstr. (51th Spring Meet. 2004); Japan Society of Applied Physics and Related Societies, No. 2<\/p>\n<p>Mutsumi Kimura, Chiharu Iriguchi, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Device Simulation of Fine TFTs&#8221;<br \/>\nExt. Abstr. (51th Spring Meet. 2004); Japan Society of Applied Physics and Related Societies, No. 2<\/p>\n<p>Mutsumi Kimura, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Temperature Dependence of Electric Conductance in Poly-Si Thin Films and Determination of the Effective Richardson Constant&#8221;<br \/>\nExt. Abstr. (51th Spring Meet. 2004); Japan Society of Applied Physics and Related Societies, No. 2<\/p>\n<p>Hiroyuki Ikeda,<br \/>\n&#8220;Characterization of Switching Transient Behaviors in Polycrystalline-Silicon Thin-Film Tansistors&#8221;<br \/>\nJpn. J. Appl. Phys. Vol.43. Issue 2, 2004, pp. 477-484<\/p>\n<p>Mutsumi Kimura, Simon W.-B. Tam, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Extraction of Trap Densities at Front- and Back-Interfaces in Thin-Film Transistors&#8221;<br \/>\nJpn. J. Appl. Phys. Pt. 1, Vol. 43, Issue 1, Jan. 2004, pp. 71-76<\/p>\n<p>Mutsumi Kimura, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Dependence of Transistor Characteristics on Trap Densities at the Front- and Back-Oxide Interfaces in Thin-Film Transistors&#8221;<br \/>\nProc. IDW \u00b403, pp. 331-334, Dec. 2003<\/p>\n<p>F. M. Hossain, J. Nishii, S. Takagi, A. Ohtomo, T. Fukumura, H. Fujioka, H. Ohno, H. Koinuma, M. Kawasaki,<br \/>\n&#8220;Modeling and simulation of polycrystalline ZnO thin-film transistors&#8221;<br \/>\nJournal of Applied Physics, Vol. 94, Issue 12, 15 December 2003, pp. 7768-7777<\/p>\n<p>M. Kimura, T. Takizawa, M. Miyasaka, S. Inoue, T. Shimoda,<br \/>\n&#8220;Analytical Current-Voltage Model for Polycrystalline Silicon Thin-Film Transistors&#8221;<br \/>\nDiffusion and Defect Data Pt.B: Solid State Phenomena, Vol. 93, 2003, pp. 79-84<\/p>\n<p>Mutsumi Kimura, Daisuke Abe, Simon W.-B. Tam, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Analysis of Plasma Treatment and Vapor Heat Treatment for Thin-Film Transistors by Extracting Trap Densities at Front- and Back-Interfaces&#8221;<br \/>\nProc. IDW \u00b403, pp. 1669-1670, Dec. 2003<\/p>\n<p>Mutsumi Kimura, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Dependence of Poly-Si TFT Characteristic on Oxide Interface Traps and Grain Boundary Traps and its Application to Diagnosis of Fabrication Processes&#8221;<br \/>\nTechnical Report of IEICE, SDM2003-180, pp. 7-12, Dec. 2003 [in Japanese]<\/p>\n<p>D. Dosev, B. Iniguez, L. F. Marsal, J. Pallares, T. Ytterdal,<br \/>\n&#8220;Device simulations of nanocrystalline silicon Thin film transistors&#8221;<br \/>\nSolid-State Electronics, Vol. 47, Issue 11, November 2003, pp. 1917-1920<\/p>\n<p>Mutsumi Kimura,<br \/>\n&#8220;Electrical Characteristic Analysis and Device Simulation of Polycrystalline Silicon Thin-Film Transistors&#8221;<br \/>\nTechnical Report of IEICE, SDM2003-161, pp. 1-8, Oct. 2003 [in Japanese]<\/p>\n<p>Mutsumi Kimura, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Extraction of Trap Densities at Front- and Back-Interfaces in Poly-Si TFTs&#8221;<br \/>\nExt. Abstr. (64th Autumn Meet. 2003); Japan Society of Applied Physics, No. 2, pp. 776, Sep. 2003<\/p>\n<p>Mutsumi Kimura,<br \/>\n&#8220;Characteristic Diagnosis of Thin-Film Transistor using Device Simulation&#8221;<br \/>\nExt. Abstr. (64th Autumn Meet. 2003); Japan Society of Applied Physics, No. 2, pp. 777, Sep. 2003<\/p>\n<p>Satoshi Inoue, Mutsumi Kimura and Tatsuya Shimoda,<br \/>\n&#8220;Analysis and Classification of Degradation Phenomena in Polycrystalline-Silicon&#8221;<br \/>\nJpn. J. Appl. Phys. Vol. 42 (2003) pp. 1168-1172<\/p>\n<p>Y. Uraoka, N. Hirai*, H. Yano, T. Hatayama and T. Fuyuki,<br \/>\n&#8220;Analysis of Reliability in Low-Temperature Polt-Si Thin Film Transistors using Pico-second Time-Resolved Emission Microscope&#8221;<br \/>\nIEDM 2002, Dec 2002. pp. 577-580<\/p>\n<p>Mutsumi Kimura, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Dependence of TFT Characteristics on Trap Densities at the Front- and Back-Oxide Interfaces&#8221;<br \/>\nExt. Abstr. (63th Autumn Meet. 2002); Japan Society of Applied Physics, No. 2, pp. 785, Sep. 2002<\/p>\n<p>Mutsumi Kimura, Teruo Takizawa, Mitsutoshi Miyasaka, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Analytical I-V Model for Poly-Si TFTs&#8221;<br \/>\nPOLYSE 2002, pp. 73, Sep. 2002<\/p>\n<p>Mutsumi Kimura, Ryoichi Nozawa, Satoshi Inoue, Tatsuya Shimoda, Basil O.-K. Lui, Simon W.-B. Tam and Piero Migliorato,<br \/>\n&#8220;Extraction of Trap States at the Oxide-Silicon Interface and Grain Boundary for Polycrystalline Silicon Thin-Film Transistors&#8221;<br \/>\nTrans. IEICE Vol. J85-C, No. 8, pp. 673-683, Aug. 2002 [in Japanese]<\/p>\n<p>Y. D. Son, K. S. Cho, S. Y. Yoo, J. U. Kwak, K. H. Kim and JinJang,<br \/>\n&#8220;A p-channel SMC poly-Si thin film-transistor with a GOLDD structure&#8221;<br \/>\nCurrent Applied Physics, Vol. 2, Issue 4, August 2002, pp. 269-272<\/p>\n<p>Mutsumi Kimura, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Dependence of Poly-Si TFT Characteristics on Oxide Inteerface Traps and Grain Boundary Traps&#8221;<br \/>\nDig. AM-LCD \u00b402, pp. 255-258, Jul. 2002<\/p>\n<p>Mutsumi Kimura,<br \/>\n&#8220;Characterization and Simulation of Thin-Film Transistors&#8221;<br \/>\nAWAD 2002, pp. 169-174, Jul. 2002<\/p>\n<p>Hiroyuki Ikeda,<br \/>\n&#8220;Evaluation of grain boundary trap states in polycrystalline-silicon thin-film transistors by mobility and capacitance measurements&#8221;<br \/>\nJournal of Applied Physics Vol. 91, No.7 April 2002, pp. 4637-4645<\/p>\n<p>Mutsumi Kimura, Teruo Takizawa, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Analytical Current-Voltage Model for Thin-Film Transistors&#8221;<br \/>\nJ. Appl. Phys. Vol. 80, No. 13, pp. 2326-2328, April 2002<\/p>\n<p>N. Tosic Golo, F. G. Kuper and T. Mouthaan,<br \/>\n&#8220;Zapping thin film transistors&#8221;<br \/>\nMicroelectronics Reliability, Vol. 42, Issues 4-5, April-May 2002, pp. 747-765<\/p>\n<p>Mutsumi Kimura, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Extraction of Defect Density at the Oxide-Si Interface and Grain Boundary for Poly-Si TFTs and SOI FET&#8221;<br \/>\nExt. Abstr. (49th Spring Meet. 2002); Japan Society of Applied Physics and Related Societies, No. 2<\/p>\n<p>Y. Nanno, K. Senda, H. Tsutsu, H. Uchiike,<br \/>\n&#8220;Development of a new design simulator for poly-Si TFTs to optimize the lightly doped drain structure&#8221;<br \/>\nJournal of the Society for Information Display, Vol. 10, Issue 1, 2002, pp. 101-106<\/p>\n<p>Mutsumi Kimura, Satoshi Inoue, Tatsuya Shimoda, Simon W.-B. Tam, Basil O.-K. Lui, Piero Migliorato and Ryoichi Nozawa,<br \/>\n&#8220;Extraction of Trap States in Laser-Crystallized Polycrystalline Silicon Thin-Film Transistors and Analysis of Degradation by Self-Heating&#8221;<br \/>\nJ. Appl. Phys. Vol. 91, No. 6, pp. 3855-3858, March 2002<\/p>\n<p>M. Kimura,<br \/>\n&#8220;Evaluation of trap states at front and back oxide interfaces and grain boundaries using electrical characteristic analysis and device simulation of polycrystalline silicon thin-film transistors&#8221;<br \/>\nElectronics and Communications in Japan, Part II: Vol. 88, Issue 2, pp. 1\u201310, February 2005<\/p>\n<p>Y. Furuta, H. Mizuta, K. Nakazato and et al.,<br \/>\n&#8220;Carrier transport across a few grain boundaries in highly doped polycrystalline silicon&#8221;<br \/>\nJpn. J. Appl. Phys. 2, Vol. 40, Jun. 2001, pp. L615&amp;L617.<\/p>\n<p>Mutsumi Kimura, O. K. Basil Lui, William French, Itaru Kamohara, Satoshi Inoue, Tatsuya Shimoda and Piero Migliorato,<br \/>\n&#8220;Development of Poly-Si TFT Models for Device Simulation: In-Plane Trap Model and Thermionic Emission Model&#8221;<br \/>\nProc. Asia Display \/ IDW \u00b401, pp. 423-426, Oct. 2001<\/p>\n<p>M. Estrada, A. Cerdeira, A. Leyva, M. N. P. Carreno and I. Pereyra,<br \/>\n&#8220;Optimization of the\u00a0<i>i-<\/i>layer width of Cr-a-Si:H\u00a0<i>PIN<\/i>\u00a0X-ray detectors&#8221;<br \/>\nThin Solid Films, Vol. 396, Issues 1-2, 21 September 2001, pp. 237-241<\/p>\n<p>Mutsumi Kimura, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Device Simulation of Thermionic Emission at Grain Boundaries in Doped Poly-Si Films&#8221;<br \/>\nExt. Abstr. (62th Autumn Meet. 2001); Japan Society of Applied Physics, No. 2, pp. 682, Sep. 2001<\/p>\n<p>Mutsumi Kimura, Simon W.-B. Tam, O. K. Basil Lui, Ryoichi Nozawa, Satoshi Inoue, Tatsuya Shimoda and Piero Migliorato,<br \/>\n&#8220;Extraction of Trap States at the Oxide-Silicon Interface and Grain Boundary in Laser-Crystallized Polycrystalline Silicon Thin-Film Transistors&#8221;<br \/>\nDig. AM-LCD \u00b401, pp. 191-192, Jul. 2001<\/p>\n<p>Mutsumi Kimura, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Development of Device, Circuit and Liquid-Crystal Simulators for Polycrystalline Silicon Thin-Film Transistors and Their Applications&#8221;<br \/>\nDissertation, Tokyo Univirsity of Agriculture and Technology, Jun. 2001<\/p>\n<p>Magali Estrada, Antonio Cerdeira, Adelmo Ortiz-Conde and Francisco Garcia,<br \/>\n&#8220;Determination of trap cross-section in a-Si:H pi-n diodes parameters using simulation and parameter extraction&#8221;<br \/>\nMicroelectronics Reliability, Vol. 41, Issue 4, April 2001, pp. 605-610<\/p>\n<p>M. Baudet, H. Lhermite, T. Mohammed-Brahim,<br \/>\n&#8220;Simulation of the backward current in polycrystalline silicon thin-film transistors&#8221;<br \/>\nDiffusion and Defect Data Pt.B: Solid State Phenomena, Vol. 80-81, 2001, pp. 379-384<\/p>\n<p>Mutsumi Kimura, Ryoichi Nozawa, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Current Density Enhancement at Active Layer Edges in Polycrystalline Silicon Thin-Film Transistors&#8221;<br \/>\nJpn. J. Appl. Phys. Vol. 40 (2001) pp.L26-L28<\/p>\n<p>Mutsumi Kimura, Satoshi Inoue, Tatsuya Shimoda and Toshiyuki Sameshima,<br \/>\n&#8220;Current Paths over Grain Boundaries in Polycrystalline Silicon Films&#8221;<br \/>\nJpn. J. Appl. Phys. Vol. 40 (2001) pp. L97-L99<\/p>\n<p>Mutsumi Kimura, Satoshi Inoue, Tatsuya Shimoda and Toshiyuki Sameshima,<br \/>\n&#8220;Device Simulation of Grain Boundaries in Lightly Doped Polysilicon Films and Analysis of Dependence on Defect Density&#8221;<br \/>\nJpn. J. Appl. Phys. Vol. 40 (2001) pp. 49-53<\/p>\n<p>Mutsumi Kimura, Satoshi Inoue, Tatsuya Shimoda and Toshiyuki Sameshima,<br \/>\n&#8220;Device Simulation of Carrier Transport through Grain Boundaries in Lightly Doped Polysilicon Films and Dependence on Dopant Density&#8221;<br \/>\nJpn. J. Appl. Phys. Vol. 40 (2001) pp. 5237-5243<\/p>\n<p>Mutsumi Kimura, Ryoichi Nozawa, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Extraction of Defect Density at the Oxide-Si Interface and Grain Boundary in Poly-Si TFTs&#8221;<br \/>\nExt. Abstr. (48th Spring Meet. 2001); Japan Society of Applied Physics and Related Societies, No. 2<\/p>\n<p>Mutsumi Kimura, Ryoichi Nozawa, Satoshi Inoue, Tatsuya Shimoda, Basil O.-K. Lui, Simon W.-B. Tam and Piero Migliorato,<br \/>\n&#8220;Extraction of Trap States at the Oxide-Silicon Interface and Grain Boundary in Polycrystalline Silicon Thin-Film Transistors&#8221;<br \/>\nJpn. J. Appl. Phys. 40 (2001) pp. 5227-5236<\/p>\n<p>Mutsumi Kimura, Satoshi Inoue, Tatsuya Shimoda and Tsukasa Eguchi,<br \/>\n&#8220;Dependence of Polycrystalline Silicon Thin-Film Transistor Characteristics on the Grain Boundary Location&#8221;<br \/>\nJ. Appl. Phys., Vol. 89, No. 1, pp. 596 600, Jan. 2001<\/p>\n<p>C. A. Dimitriadis, M. Kimura, M. Miyasaka, S. Inoue, F. V. Farmakis, J. Brini and G. Kamarinos,<br \/>\n&#8220;Effect of grain boundaries on hot-carrier induced degradation in large grain polysilicon thin-film transistors&#8221;<br \/>\nSolid-State Electronics, Vol. 44, Issue 11, 1 November 2000, pp. 2045-2051<\/p>\n<p>Shih-Chung Lee and M. J. Lee,<br \/>\n&#8220;Effects of multi-energetic grain-boundary trapping states on the electrical characteristics of poly-CdSe thin film transistors&#8221;<br \/>\nJournal of Applied Physics, Vol. 88, No. 4, pp. 1999-2004, 15 August 2000<\/p>\n<p>Mutsumi Kimura, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Device Simulation of Grain Boundaries and MOS Interface Roughness in Laser-Crystallized Poly-Si TFTs&#8221;<br \/>\nDig. AM-LCD 2000, pp. 189-190, Jul. 2000<\/p>\n<p>Mutsumi Kimura, Seiichiro Higashi and Toshiyuki Sameshima,<br \/>\n&#8220;Device Simulation of Grain Boundaries in Poly-Si Films&#8221;<br \/>\nTechnical Report of IEICE, ED2000-11, pp. 9-14, April 2000 [in Japanese]<\/p>\n<p>Mutsumi Kimura, Seiichiro Higashi and Toshiyuki Sameshima,<br \/>\n&#8220;Device Simulation of Grain Boundaries in Polysilicon films&#8221;<br \/>\nExt. Abstr. (47th Spring Meet. 2000); Japan Society of Applied Physics and Related Societies, No. 2<\/p>\n<p>Mutsumi Kimura, Tsukasa Eguchi, Satoshi Inoue and Tatsuya Shimoda,<br \/>\n&#8220;Device Simulation of Grain Boundaries with Oxide-Silicon Interface Roughness in Laser-Crystallized Polycrystalline Silicon Thin-Film Transistors&#8221;<br \/>\nJpn. J. Appl. Phys. Vol. 39 (2000) pp. L775-L778<\/p>\n<p>J. S. Yoo et al.,<br \/>\n&#8220;Reliability of low temperature poly-Si TFT employing counter-doped lateral body terminal&#8221;<br \/>\nProc. IEDM 2000, pp. 217-220.<\/p>\n<p>Mutsumi Kimura and Satoshi Inoue,<br \/>\n&#8220;Device Simulation of Interface Roughness in Laser-Crystallized p-Si TFTs&#8221;<br \/>\nDig. AM-LCD \u00b499, pp. 263-266, Jul. 1999<\/p>\n<p>F. V. Farmakis, C. A. Dimitriadis, J. Brini, G. Kamarinos, V. K. Gueorguiev and Tz. E. Ivanov,<br \/>\n&#8220;Hot-carrier phenomena in high temperature processed undoped-hydrogenated n-channel polysilicon thin film transistors (TFTs)&#8221;<br \/>\nSolid-State Electronics, Vol. 43, Issue 7, July 1999, pp. 1259-1266<\/p>\n<p>M. J. Lee and Shih-Chung Lee,<br \/>\n&#8220;Extraction of the trap density and mobility in poly-CdSe thin films&#8221;<br \/>\nSolid-State Electronics, Vol. 43, Issue 4, April 1999, pp. 833-838<\/p>\n<p>G. A. Armstrong, J. R. Ayres and S. D. Brotherton,<br \/>\n&#8220;Numerical simulation of transient emission from deep level traps in polysilicon thin film transistors&#8221;<br \/>\nSolid-State Electronics, Vol. 41, Issue 6, June 1997, pp. 835-844<\/p>\n<p>Armstrong, G. A., Brotherton S. D. and Ayres, J. R.,<br \/>\n&#8220;Simulation of transient emission in polysilicon thin film transistors&#8221;<br \/>\nSolid State Electronics, 40, 1997, pp 835-844<\/p>\n<p>Armstrong, G. A. and Uppal S.,<br \/>\n&#8220;Modelling of laser annealed polysilicon thin film transistor characteristics&#8221;<br \/>\nIEEE Transactions Electron Device Letters, Vol. 18, Issue 7, July 1997, pp 315-318<\/p>\n<p>Uppal S. and Armstrong G. A.,<br \/>\n&#8220;Differentiation of grain and grain boundary effects in polysilicon thin film transistors&#8221;<br \/>\nProc SSDM, Hamamatsu, Japan, 1997, pp. 356-357<\/p>\n<p>Armstrong, G. A. Brotherton S. D. and Ayres, J. R.,<br \/>\n&#8220;A comparison of the kink effect in polysilicon thin film transistors and silicon on insulator transistors&#8221;<br \/>\nSolid State Electronics, Vol. 39, Issue 9, September 1996, pp. 1337-1346<\/p>\n","protected":false},"excerpt":{"rendered":"<p>TFT Technology The full text for most of these papers may be found at the IEEE website at\u00a0www.ieee.org. Yu-Shien Shiah1,\u00a0Kihyung Sim1, Yuhao Shi1, Katsumi Abe2, Shigenori Ueda3, Masato Sasase1, Junghwan Kim1\u00a0&amp; Hideo Hosono1,3 Mobility\u2013stability trade-off in oxide thin-film transistors Materials Research Center for Element Strategy, Tokyo Institute of Technology, Yokohama, Japan Silvaco Japan, Japan WPI-MANA, [&hellip;]<\/p>\n","protected":false},"author":3,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"inline_featured_image":false,"footnotes":""},"categories":[7759,7913,7768],"tags":[],"class_list":["post-35835","post","type-post","status-publish","format-standard","hentry","category-tcad-published-papers-zh-hans","category-technical-libraries","category-tft-technology-zh-hans","entry"],"yoast_head":"<!-- This site is optimized with the Yoast SEO Premium plugin v28.7 (Yoast SEO v28.7) - https:\/\/yoast.com\/product\/yoast-seo-premium-wordpress\/ -->\n<title>TFT Technology - Silvaco<\/title>\n<meta name=\"description\" content=\"Published papers on TFT Technology\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/silvaco.com\/zh-hans\/tcad-zh-hans\/tcad-published-papers-zh-hans\/tft-technology\/\" \/>\n<meta property=\"og:locale\" content=\"zh_CN\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"TFT Technology\" \/>\n<meta property=\"og:description\" content=\"Published papers on TFT Technology\" \/>\n<meta property=\"og:url\" content=\"https:\/\/silvaco.com\/zh-hans\/tcad-zh-hans\/tcad-published-papers-zh-hans\/tft-technology\/\" \/>\n<meta property=\"og:site_name\" content=\"Silvaco\" \/>\n<meta property=\"article:publisher\" content=\"https:\/\/www.facebook.com\/SilvacoSoftware\/\" \/>\n<meta property=\"article:published_time\" content=\"2020-02-26T17:52:49+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2026-10-02T15:41:20+00:00\" \/>\n<meta name=\"author\" content=\"Erick Castellon\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:creator\" content=\"@SilvacoSoftware\" \/>\n<meta name=\"twitter:site\" content=\"@SilvacoSoftware\" \/>\n<meta name=\"twitter:label1\" content=\"\u4f5c\u8005\" \/>\n\t<meta name=\"twitter:data1\" content=\"Erick Castellon\" \/>\n\t<meta name=\"twitter:label2\" content=\"\u9884\u8ba1\u9605\u8bfb\u65f6\u95f4\" \/>\n\t<meta name=\"twitter:data2\" content=\"14 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\\\/\\\/schema.org\",\"@graph\":[{\"@type\":\"Article\",\"@id\":\"https:\\\/\\\/silvaco.com\\\/zh-hans\\\/tcad-zh-hans\\\/tcad-published-papers-zh-hans\\\/tft-technology\\\/#article\",\"isPartOf\":{\"@id\":\"https:\\\/\\\/silvaco.com\\\/zh-hans\\\/tcad-zh-hans\\\/tcad-published-papers-zh-hans\\\/tft-technology\\\/\"},\"author\":{\"name\":\"Erick Castellon\",\"@id\":\"https:\\\/\\\/silvaco.com\\\/#\\\/schema\\\/person\\\/e1dfed88a8f7a514e8e8414ad093e4f8\"},\"headline\":\"TFT Technology\",\"datePublished\":\"2020-02-26T17:52:49+00:00\",\"dateModified\":\"2026-10-02T15:41:20+00:00\",\"mainEntityOfPage\":{\"@id\":\"https:\\\/\\\/silvaco.com\\\/zh-hans\\\/tcad-zh-hans\\\/tcad-published-papers-zh-hans\\\/tft-technology\\\/\"},\"wordCount\":2720,\"articleSection\":[\"TCAD Published Papers\",\"Technical Libraries\",\"TFT Technology\"],\"inLanguage\":\"zh-CN\"},{\"@type\":\"WebPage\",\"@id\":\"https:\\\/\\\/silvaco.com\\\/zh-hans\\\/tcad-zh-hans\\\/tcad-published-papers-zh-hans\\\/tft-technology\\\/\",\"url\":\"https:\\\/\\\/silvaco.com\\\/zh-hans\\\/tcad-zh-hans\\\/tcad-published-papers-zh-hans\\\/tft-technology\\\/\",\"name\":\"TFT Technology - 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