{"id":46779,"date":"2023-02-09T11:31:09","date_gmt":"2023-02-09T19:31:09","guid":{"rendered":"https:\/\/silvaco.com\/%eb%b6%84%eb%a5%98%eb%90%98%ec%a7%80-%ec%95%8a%ec%9d%8c\/simulation-standard-automatic-grid-refinement-for-thin-material-layer-etching-in-process-tcad-simulations\/"},"modified":"2023-03-07T15:33:56","modified_gmt":"2023-03-07T23:33:56","slug":"simulation-standard-automatic-grid-refinement-for-thin-material-layer-etching-in-process-tcad-simulations","status":"publish","type":"post","link":"https:\/\/silvaco.com\/ko\/simulation-standard\/automatic-grid-refinement-for-thin-material-layer-etching-in-process-tcad-simulations\/","title":{"rendered":"Automatic Grid Refinement for Thin Material Layer Etching in Process TCAD Simulations"},"content":{"rendered":"<div id='template_overview'  class='avia-section main_color avia-section-small avia-no-border-styling  avia-bg-style-scroll  avia-builder-el-0  avia-builder-el-no-sibling   container_wrap fullsize' style='background-color: #ffffff;  margin-top:0px; margin-bottom:0px; '  ><div class='container' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-46779'><div class='entry-content-wrapper clearfix'>\n<div class='flex_column_table av-equal-height-column-flextable -flextable' style='margin-top:20px; margin-bottom:0px; '><div class=\"flex_column av_three_fourth  flex_column_table_cell av-equal-height-column av-align-top first  avia-builder-el-1  el_before_av_one_fourth  avia-builder-el-first  \" style='padding:0px 0px 0px 0px ; border-radius:0px; '><section class=\"av_textblock_section \"  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock  '   itemprop=\"text\" ><h1>Automatic Grid Refinement for Thin Material Layer Etching in Process TCAD Simulations<\/h1>\n<h4><em>Presented at the 2022 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)<\/em><\/h4>\n<p><em><strong><img loading=\"lazy\" decoding=\"async\" class=\" wp-image-46754 alignright\" src=\"https:\/\/silvaco.com\/wp-content\/uploads\/2023\/02\/ss_Feb2023_image-300x287.jpg\" alt=\"SimStd Feb 2023 Main Image\" width=\"185\" height=\"177\" srcset=\"https:\/\/silvaco.com\/wp-content\/uploads\/2023\/02\/ss_Feb2023_image-300x287.jpg 300w, https:\/\/silvaco.com\/wp-content\/uploads\/2023\/02\/ss_Feb2023_image-39x37.jpg 39w, https:\/\/silvaco.com\/wp-content\/uploads\/2023\/02\/ss_Feb2023_image-57x55.jpg 57w, https:\/\/silvaco.com\/wp-content\/uploads\/2023\/02\/ss_Feb2023_image-48x46.jpg 48w, https:\/\/silvaco.com\/wp-content\/uploads\/2023\/02\/ss_Feb2023_image.jpg 500w\" sizes=\"(max-width: 185px) 100vw, 185px\" \/>Abstract<\/strong><\/em>\u2014The utilization of thin material layers is common in modern semiconductor device fabrication. Subsequent etching steps require an accurate modeling of these thin layers. Although level-set based process TCAD simulations are capable of representing flat thin material layers with sub-grid accuracy, topographical changes during etching processes expose the low underlying grid resolution, which leads to detrimental artifacts. We present a novel algorithm that analyzes the thickness of all material layers and suggests a refined target resolution for local regions of thin layers affected by the etching process. This allows to accurately represent topographical changes in thin layers without refining unaffected regions of the domain. We simulate the fabrication of a light-emitting diode device, where our algorithm is used to automatically predict the optimal resolution for all etched material layers. Our algorithm selects efficient refinement factors to obtain the target resolutions with locally employed hierarchical grids.<\/p>\n<\/div><\/section><\/div><div class='av-flex-placeholder'><\/div><div class=\"flex_column av_one_fourth  flex_column_table_cell av-equal-height-column av-align-top av-zero-column-padding   avia-builder-el-3  el_after_av_three_fourth  avia-builder-el-last  \" style='border-radius:0px; ' id=\"whitepaper\" ><p><div  class='avia-builder-widget-area clearfix  avia-builder-el-4  el_before_av_image  avia-builder-el-first '><div id=\"nav_menu-29\" class=\"widget clearfix widget_nav_menu\"><div class=\"menu-simulation-standard-side-menu-korean-container\"><ul id=\"menu-simulation-standard-side-menu-korean\" class=\"menu\"><li id=\"menu-item-25039\" class=\"menu-item menu-item-type-post_type menu-item-object-page menu-item-25039\"><a href=\"https:\/\/silvaco.com\/ko\/technical-library\/simulation-standard\/\">Simulation Standard<\/a><\/li>\n<\/ul><\/div><\/div><\/div><br \/>\n<div  class='avia-image-container  av-styling-    avia-builder-el-5  el_after_av_sidebar  el_before_av_button  avia-align-center '  itemprop=\"image\" itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/ImageObject\"  ><div class='avia-image-container-inner'><div class='avia-image-overlay-wrap'><a href=\"\/dynamicweb\/jsp\/downloads\/DownloadDocStepsAction.do?req=download&amp;nm=Q1_SS_Feb2023.pdf\" class='avia_image' target=\"_blank\" rel=\"noopener noreferrer\"><img decoding=\"async\" width=\"232\" height=\"300\" class='wp-image-47705 avia-img-lazy-loading-not-47705 avia_image' src=\"https:\/\/silvaco.com\/wp-content\/uploads\/2023\/02\/Q1_SS_Feb2023-232x300.png\" alt='' title='Q1_SS_Feb2023'  itemprop=\"thumbnailUrl\" srcset=\"https:\/\/silvaco.com\/wp-content\/uploads\/2023\/02\/Q1_SS_Feb2023-232x300.png 232w, https:\/\/silvaco.com\/wp-content\/uploads\/2023\/02\/Q1_SS_Feb2023-29x37.png 29w, https:\/\/silvaco.com\/wp-content\/uploads\/2023\/02\/Q1_SS_Feb2023-43x55.png 43w, https:\/\/silvaco.com\/wp-content\/uploads\/2023\/02\/Q1_SS_Feb2023-37x48.png 37w, https:\/\/silvaco.com\/wp-content\/uploads\/2023\/02\/Q1_SS_Feb2023.png 250w\" sizes=\"(max-width: 232px) 100vw, 232px\" \/><\/a><\/div><\/div><\/div><br \/>\n<div  class='avia-button-wrap avia-button-center  avia-builder-el-6  el_after_av_image  avia-builder-el-last ' ><a href='\/dynamicweb\/jsp\/downloads\/DownloadDocStepsAction.do?req=download&amp;nm=Q1_SS_Feb2023.pdf' class='avia-button  avia-color-grey   avia-icon_select-yes-right-icon avia-size-small avia-position-center ' target=\"_blank\" rel=\"noopener noreferrer\"><span class='avia_iconbox_title' >Download Simulation Standard<\/span><span class='avia_button_icon avia_button_icon_right' aria-hidden='true' data-av_icon='\ue875' data-av_iconfont='entypo-fontello'><\/span><\/a><\/div><\/p><\/div><\/div><!--close column table wrapper. Autoclose: 1 -->\n","protected":false},"excerpt":{"rendered":"<p>The utilization of thin material layers is common in modern semiconductor device fabrication. Subsequent etching steps require an accurate modeling of these thin layers. Although level-set based process TCAD simulations are capable of representing flat thin material layers with sub-grid accuracy, topographical changes during etching processes expose the low underlying grid resolution, which leads to detrimental artifacts.<\/p>\n","protected":false},"author":8,"featured_media":47705,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[7486],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO Premium plugin v24.0 (Yoast SEO v24.0) - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Automatic Grid Refinement for Thin Material Layer Etching in Process TCAD Simulations - Silvaco<\/title>\n<meta name=\"description\" content=\"Automatic Grid Refinement for Thin Material Layer Etching in Process TCAD Simulations - Abstract\u2014The utilization of thin material layers is\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/silvaco.com\/ko\/simulation-standard\/automatic-grid-refinement-for-thin-material-layer-etching-in-process-tcad-simulations\/\" \/>\n<meta property=\"og:locale\" content=\"ko_KR\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Automatic Grid Refinement for Thin Material Layer Etching in Process TCAD Simulations\" \/>\n<meta property=\"og:description\" content=\"Automatic Grid Refinement for Thin Material Layer Etching in Process TCAD Simulations - 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