{"id":31704,"date":"2020-02-26T19:05:55","date_gmt":"2020-02-26T19:05:55","guid":{"rendered":"https:\/\/silvaco.com\/%eb%b6%84%eb%a5%98%eb%90%98%ec%a7%80-%ec%95%8a%ec%9d%8c\/mems\/"},"modified":"2020-02-26T19:05:55","modified_gmt":"2020-02-26T19:05:55","slug":"mems","status":"publish","type":"post","link":"https:\/\/silvaco.com\/ko\/tcad-ko\/tcad-published-papers-ko\/mems\/","title":{"rendered":"MEMS"},"content":{"rendered":"
\n

MEMS<\/h1>\n

The full text for most of these papers may be found at the IEEE website at\u00a0www.ieee.org<\/a>.<\/p>\n

Yonghyun Shim, Member, IEEE, Jean-Pierre Raskin, Member, IEEE, C\u00e9sar Roda Neve, Member, IEEE, and Mina Rais-Zadeh, Senior Member, IEEE
\n“RF MEMS Passives on High-Resistivity Silicon Substrates”
\nIEEE MICROWAVE AND WIRELESS COMPONENTS LETTERS, VOL. 23, NO. 12, DECEMBER 2013<\/p>\n

A. Baharin, M. R. Hashim,
\n“Study of electrical characteristics of Ge islands MSM photodetector structure grown on Si substrate using conventional methods”
\nSemiconductor Science and Technology, Vol. 22, No. 8, Aug. 2007, pp. 905-910.<\/p>\n

T. Schmidt, K. Hahna, T. Binderc, J. Poppb, A. Wagener, R. Br\u00fcck,
\n“Optimization of MEMS fabrication process design by virtual experiments”
\nProceedings of SPIE – The International Society for Optical Engineering Vol. 5-8 Dec. 20, 2006<\/p>\n

Yong Qing Fu1<\/sup>, Jack Luo1<\/sup>, Stuart Milne1<\/sup>, Andrew Flewitt1<\/sup>, Ahmed Nejim2<\/sup>
\n“Process Flow Simulation and Manufacture of Variable RF MEMS Capacitors\u00a0“,
\n1<\/sup>Engineering Department, University of Cambridge, Cambridge UK
\n2<\/sup>Silvaco, St Ives, Cambridgeshire PE27 5JL, UK<\/p>\n

T. Bourouina, T. Masuzawa, H. Fujita,
\n“The MEMSNAS process: Microloading effect for micromachining 3-D structures of nearly all shapes”
\nJournal of Microelectromechanical Systems, Vol. 13, Issue 2, April 2004, pp. 190-199.<\/p>\n<\/div><\/section><\/div>

<\/div>