{"id":31606,"date":"1998-08-04T15:21:45","date_gmt":"1998-08-04T15:21:45","guid":{"rendered":"https:\/\/silvaco.com\/%eb%b6%84%eb%a5%98%eb%90%98%ec%a7%80-%ec%95%8a%ec%9d%8c\/hints-tips-august-1998\/"},"modified":"2021-07-16T22:35:00","modified_gmt":"2021-07-17T05:35:00","slug":"hints-tips-august-1998","status":"publish","type":"post","link":"https:\/\/silvaco.com\/ko\/simulation-standard-ko\/hints-tips-august-1998\/","title":{"rendered":"HINTS & TIPS – August 1998"},"content":{"rendered":"
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HINTS & TIPS<\/h1>\n

Q:\u00a0<\/b>How can the lateral implant straggle be tuned separately to the vertical implant profile?<\/p>\n

A:<\/b>\u00a0When using the analytical implant tables in\u00a0ATHENA<\/b>\u00a0the default model for the lateral implant range assumes a gaussian profile with a standard deviation equal to the vertical standard deviation (delta Rp) read from the table. This approximation is reasonable for amorphous implant substrates. This includes cases where the implant beam has been amorphised by a screen oxide or is implanted at a high angle.<\/p>\n

Tuning of the lateral implant range can be done by specifying the lateral standard deviation prior to the implant:<\/p>\n

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MOMENTS ...... LSTD.DEV=<value><\/tt><\/p>\n

IMPLANT ......<\/tt><\/p>\n<\/blockquote>\n

However this is cumbersome to use in many cases since the<\/span>\u00a0MOMENTS<\/tt>\u00a0statement requires explicit definition of the implant dose and energy and all the vertical implant parameters. Therefore it is more convenient to use a unit less scaling parameter<\/span>\u00a0LAT.RATIO1\u00a0<\/tt>on the<\/span>\u00a0IMPLANT<\/tt>\u00a0statement to multiply the default lateral straggle by a factor. The default for<\/span>\u00a0LAT.RATIO1<\/tt>\u00a0is 1.0 so to slightly increase the lateral straggle of an arsenic implant the following syntax might be used:<\/span><\/p>\n

\n

IMPLANT ARSENIC DOSE=<v> ENERGY=<v> LAT.RATIO1=1.2 PRINT.MOM<\/tt><\/p>\n<\/blockquote>\n

This<\/span>\u00a0PRINT.MOM<\/tt>\u00a0parameter is included as a useful check. It prints the implant moments used into the run-time output. Figure 1 shows the effect of adjusting only<\/span>\u00a0LAT.RATIO1.<\/tt>\u00a0The vertical implant depth is constant while the lateral implant straggle can be tuned to match electrical results.<\/span><\/p>\n<\/div><\/section><\/div>

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