{"id":30878,"date":"2012-10-01T15:06:04","date_gmt":"2012-10-01T15:06:04","guid":{"rendered":"https:\/\/silvaco.com\/%eb%b6%84%eb%a5%98%eb%90%98%ec%a7%80-%ec%95%8a%ec%9d%8c\/calibration-of-the-ion-enhanced-chemical-etching-model-of-victory-process-using-virtual-wafer-fab\/"},"modified":"2021-07-16T21:42:16","modified_gmt":"2021-07-17T04:42:16","slug":"calibration-of-the-ion-enhanced-chemical-etching-model-of-victory-process-using-virtual-wafer-fab","status":"publish","type":"post","link":"https:\/\/silvaco.com\/ko\/simulation-standard-ko\/calibration-of-the-ion-enhanced-chemical-etching-model-of-victory-process-using-virtual-wafer-fab\/","title":{"rendered":"Calibration of the Ion Enhanced Chemical Etching Model of VICTORY Process Using Virtual Wafer Fab"},"content":{"rendered":"<div id='template_overview'  class='avia-section main_color avia-section-small avia-no-border-styling  avia-bg-style-scroll  avia-builder-el-0  el_before_av_section  avia-builder-el-first   container_wrap fullsize' style='background-color: #ffffff;  margin-top:0px; margin-bottom:0px; '  ><div class='container' ><main  role=\"main\" itemprop=\"mainContentOfPage\"  class='template-page content  av-content-full alpha units'><div class='post-entry post-entry-type-page post-entry-30878'><div class='entry-content-wrapper clearfix'>\n<div class='flex_column_table av-equal-height-column-flextable -flextable' style='margin-top:20px; margin-bottom:0px; '><div class=\"flex_column av_three_fourth  flex_column_table_cell av-equal-height-column av-align-top first  avia-builder-el-1  el_before_av_one_fourth  avia-builder-el-first  \" style='padding:0px 0px 0px 0px ; border-radius:0px; '><section class=\"av_textblock_section \"  itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/BlogPosting\" itemprop=\"blogPost\" ><div class='avia_textblock  '   itemprop=\"text\" ><h1>Calibration of the Ion Enhanced Chemical Etching Model of VICTORY Process Using Virtual Wafer Fab<\/h1>\n<p>In this article we describe a technique to automatically calibrate parameters of an Ion Enhanced Chemical Etching model implemented in the 3D process simulator VICTORY Process to measurements published in [1]. We will briefly describe the model and show how an experiment applying this model can be set up in VWF to automate the calibration by carrying out several individual simulations without user interaction.<\/p>\n<p><strong>Virtual Wafer Fab \u2013 VWF<\/strong><\/p>\n<p>Virtual Wafer Fab (VWF) is software that:<\/p>\n<ul>\n<li>conveniently sets up simulation experiments<\/li>\n<li>automates running an arbitrary number of individual simulations in parallel on a workstation and a cluster of workstations<\/li>\n<li>performs comprehensive analysis on the data generated by the set of simulations<\/li>\n<li>automatically optimizes simulation parameters with respect to a variety of optimization targets<\/li>\n<\/ul>\n<p>The fundamental concept of VWF is to define (choose) a strategy to vary parameters within given bounds and to let the software carry out the simulations and obtain the simulation results. Once the virtual experiment has finished, results can be investigated by looking into created structures and electrical characteristics, and by applying statistical methods or visualization techniques.<\/p>\n<p><strong>Experiment Strategies<br \/>\n<\/strong>VWF offers two main strategies for varying parameters. The first strategy is to use one of several supported Designs of Experiments (DOE), whereby a predefined sample of the input parameter set is taken and simulated. The supported DOE types range from Full-Factorial, to Box-Behnken to Latin-Hypercube. In addition, user-defined types are also available which use JavaScript to sample the parameter space.<\/p>\n<p>The second strategy is to use an optimization algorithm to vary the parameter set. Once started, the experiment keeps running and performs simulations with varied parameters until a defined target value is achieved. VWF offers various optimization algorithms ranging from:<\/p>\n<ul>\n<li>local, gradient-based methods, like Levenberg-Marquardt<\/li>\n<li>global optimization algorithms, like Genetic Optimization, Simulated Annealing or Parallel Tempering<\/li>\n<\/ul>\n<\/div><\/section><\/div><div class='av-flex-placeholder'><\/div><div class=\"flex_column av_one_fourth  flex_column_table_cell av-equal-height-column av-align-top av-zero-column-padding   avia-builder-el-3  el_after_av_three_fourth  avia-builder-el-last  \" style='border-radius:0px; ' id=\"whitepaper\" ><p><div  class='avia-builder-widget-area clearfix  avia-builder-el-4  el_before_av_image  avia-builder-el-first '><div id=\"nav_menu-29\" class=\"widget clearfix widget_nav_menu\"><div class=\"menu-simulation-standard-side-menu-korean-container\"><ul id=\"menu-simulation-standard-side-menu-korean\" class=\"menu\"><li id=\"menu-item-25039\" class=\"menu-item menu-item-type-post_type menu-item-object-page menu-item-25039\"><a href=\"https:\/\/silvaco.com\/ko\/technical-library\/simulation-standard\/\">Simulation Standard<\/a><\/li>\n<\/ul><\/div><\/div><\/div><br \/>\n<div  class='avia-image-container  av-styling-    avia-builder-el-5  el_after_av_sidebar  el_before_av_button  avia-align-center '  itemprop=\"image\" itemscope=\"itemscope\" itemtype=\"https:\/\/schema.org\/ImageObject\"  ><div class='avia-image-container-inner'><div class='avia-image-overlay-wrap'><a href=\"\/dynamicweb\/jsp\/downloads\/DownloadDocStepsAction.do?req=download&amp;nm=simstd_Q4_2012_a4.pdf\" class='avia_image' target=\"_blank\" rel=\"noopener noreferrer\"><img decoding=\"async\" width=\"232\" height=\"300\" class='wp-image-19584 avia-img-lazy-loading-not-19584 avia_image' src=\"https:\/\/silvaco.com\/wp-content\/uploads\/2020\/03\/simstd_Q4_2012_a4-232x300.jpg\" alt='' title='simstd_Q4_2012_a4'  itemprop=\"thumbnailUrl\" srcset=\"https:\/\/silvaco.com\/wp-content\/uploads\/2020\/03\/simstd_Q4_2012_a4-232x300.jpg 232w, https:\/\/silvaco.com\/wp-content\/uploads\/2020\/03\/simstd_Q4_2012_a4-768x994.jpg 768w, https:\/\/silvaco.com\/wp-content\/uploads\/2020\/03\/simstd_Q4_2012_a4-545x705.jpg 545w, https:\/\/silvaco.com\/wp-content\/uploads\/2020\/03\/simstd_Q4_2012_a4-29x37.jpg 29w, https:\/\/silvaco.com\/wp-content\/uploads\/2020\/03\/simstd_Q4_2012_a4-43x55.jpg 43w, https:\/\/silvaco.com\/wp-content\/uploads\/2020\/03\/simstd_Q4_2012_a4-37x48.jpg 37w, https:\/\/silvaco.com\/wp-content\/uploads\/2020\/03\/simstd_Q4_2012_a4.jpg 782w\" sizes=\"(max-width: 232px) 100vw, 232px\" \/><\/a><\/div><\/div><\/div><br \/>\n<div  class='avia-button-wrap avia-button-center  avia-builder-el-6  el_after_av_image  avia-builder-el-last ' ><a href='\/dynamicweb\/jsp\/downloads\/DownloadDocStepsAction.do?req=download&amp;nm=simstd_Q4_2012_a4.pdf' class='avia-button  avia-color-grey   avia-icon_select-yes-right-icon avia-size-small avia-position-center ' target=\"_blank\" rel=\"noopener noreferrer\"><span class='avia_iconbox_title' >Download Simulation Standard<\/span><span class='avia_button_icon avia_button_icon_right' aria-hidden='true' data-av_icon='\ue875' data-av_iconfont='entypo-fontello'><\/span><\/a><\/div><\/p><\/div><\/div><!--close column table wrapper. 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Autoclose: 1 -->\n<\/p>\n","protected":false},"excerpt":{"rendered":"<p>In this article we describe a technique to automatically calibrate parameters of an Ion Enhanced Chemical Etching model implemented in the 3D process simulator VICTORY Process to measurements published in [1]. We will briefly describe the model and show how an experiment applying this model can be set up in VWF to automate the calibration by carrying out several individual simulations without user interaction.<\/p>\n","protected":false},"author":5,"featured_media":19584,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[7486],"tags":[],"yoast_head":"<!-- This site is optimized with the Yoast SEO Premium plugin v24.0 (Yoast SEO v24.0) - https:\/\/yoast.com\/wordpress\/plugins\/seo\/ -->\n<title>Calibration of the Ion Enhanced Chemical Etching Model of VICTORY Process Using Virtual Wafer Fab - Silvaco<\/title>\n<meta name=\"description\" content=\"In this article we describe a technique to automatically calibrate parameters of an Ion Enhanced Chemical Etching model implemented\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/silvaco.com\/ko\/simulation-standard-ko\/calibration-of-the-ion-enhanced-chemical-etching-model-of-victory-process-using-virtual-wafer-fab\/\" \/>\n<meta property=\"og:locale\" content=\"ko_KR\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Calibration of the Ion Enhanced Chemical Etching Model of VICTORY Process Using Virtual Wafer Fab\" \/>\n<meta property=\"og:description\" content=\"In this article we describe a technique to automatically calibrate parameters of an Ion Enhanced Chemical Etching model implemented\" \/>\n<meta property=\"og:url\" content=\"https:\/\/silvaco.com\/ko\/simulation-standard-ko\/calibration-of-the-ion-enhanced-chemical-etching-model-of-victory-process-using-virtual-wafer-fab\/\" \/>\n<meta property=\"og:site_name\" content=\"Silvaco\" \/>\n<meta property=\"article:publisher\" content=\"https:\/\/www.facebook.com\/SilvacoSoftware\/\" \/>\n<meta property=\"article:published_time\" content=\"2012-10-01T15:06:04+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2021-07-17T04:42:16+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/silvaco.com\/wp-content\/uploads\/2020\/03\/simstd_Q4_2012_a4.jpg\" \/>\n\t<meta property=\"og:image:width\" content=\"782\" \/>\n\t<meta property=\"og:image:height\" content=\"1012\" \/>\n\t<meta property=\"og:image:type\" content=\"image\/jpeg\" \/>\n<meta name=\"author\" content=\"Ingrid Schwarz\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:creator\" content=\"@SilvacoSoftware\" \/>\n<meta name=\"twitter:site\" content=\"@SilvacoSoftware\" \/>\n<meta name=\"twitter:label1\" content=\"\uae00\uc4f4\uc774\" \/>\n\t<meta name=\"twitter:data1\" content=\"Ingrid Schwarz\" \/>\n\t<meta name=\"twitter:label2\" content=\"\uc608\uc0c1 \ub418\ub294 \ud310\ub3c5 \uc2dc\uac04\" \/>\n\t<meta name=\"twitter:data2\" content=\"6\ubd84\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/silvaco.com\/ko\/simulation-standard-ko\/calibration-of-the-ion-enhanced-chemical-etching-model-of-victory-process-using-virtual-wafer-fab\/\",\"url\":\"https:\/\/silvaco.com\/ko\/simulation-standard-ko\/calibration-of-the-ion-enhanced-chemical-etching-model-of-victory-process-using-virtual-wafer-fab\/\",\"name\":\"Calibration of the Ion Enhanced Chemical Etching Model of VICTORY Process Using Virtual Wafer Fab - 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