2022년 8월 12일 | 2:00am-2:30am (한국 시각)
이번 시간에, FinFET 및 메모리 애플리케이션에서의 기하학적 식각 모델을 제시합니다. 핀의 형성, 비이상적 식각 프로파일 (휘어짐, 비틀림), 자체 정렬 공정 (멀티 패터닝)을 실현하는 기술을 설명합니다.
/wp-content/uploads/2019/11/silvaco-logo.png00Gigi Boss/wp-content/uploads/2019/11/silvaco-logo.pngGigi Boss2022-07-08 15:53:192022-08-16 19:27:27Victory TCAD 솔루션을 통해 FinFET 및 메모리 애플리케이션에서 정확한 실험 식각 프로파일을 효율적으로 달성
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