Current Collapse Phenomenon in GaN HFETs resulting from Intentional Bulk Iron (Fe) Doping and Un-intentional Interface Traps
The Gallium Nitride-based material family has fundamental material properties which make it an attractive candidate for semiconductor device fabrication.
These properties include:
High saturation velocities and breakdown field strength
Direct bandgap, allowing fabrication of light emitting devices
The ability to form hetero-structures using aluminum or indium
Large bandgaps allowing high temperature operation