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Graham Bell

Know how your circuit behaves across process variation before silicon tells you, with Monte Carlo-accurate results up to 30X faster.

26 years ago

Fast, Physical, Predictive and Calibrated Modeling of Ion Implantation

In a Research & Development environment, Technology Computer Aided Design (TCAD) is involved in the device optimization loop and requires efficient and predictive implantation modeling with frequent updating of the

26 years ago

Can Atlas be used to simulate advanced III-V or II-VI materials?

Yes. ATLAS now supports a wide range of materials in its database. This database covers single element conductors, binary compounds and quaternary compounds. A complete list of all materials can

26 years ago

Modeling and Parameter Extraction Technique for HV MOS Devices with BSIM3v3

In this paper, I have used the same technique to model uni-directional HV MOS devices as previously reported for bi-directional HV MOS devices [4] -[5] while adopting a new parameter

26 years ago

New RF MOSFET Small Signal SPICE Model – Part 2

RF MOSFET Small - Signal Model and Parameters Small-signal equivalent circuit of MOSFET after de-embedding parasitics is shown in Figure 1 and small-signal model parameters are listed in Table 1.

26 years ago

UFSOI: Process-Based Compact SOI MOSFET Models

SOI technology appears now to have become an advantageous, viable option for low-voltage and high-performance CMOS integrated circuits in digital, analog, and mixed-signal applications. The thin-film nature of the SOI