{"id":29594,"date":"2000-05-02T16:00:43","date_gmt":"2000-05-02T16:00:43","guid":{"rendered":"https:\/\/silvaco.com\/uncategorized\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/"},"modified":"2026-10-15T14:37:20","modified_gmt":"2026-10-15T21:37:20","slug":"calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation","status":"publish","type":"post","link":"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/","title":{"rendered":"Calibrated and Predictive Simulation of Doping Profiles: Low Energy As, B and BF2 Ion Implantation"},"content":{"rendered":"<h1><strong>Calibrated and Predictive Simulation of Doping Profiles: Low Energy As, B and BF2 Ion Implantation<\/strong><\/h1>\n<p><center class=\"regular\">P. Scheiblin<br \/>\nLETI (CEA-Grenoble) &#8211; 17, rue des Martyrs &#8211; 38054 Grenoble Cedex 09 &#8211; FRANCE<\/center><span class=\"feature\">Introduction<\/span><\/p>\n<p><span class=\"regular\">This article will present an efficient and original methodology for global and predictive modeling of low energy Boron, BF2 and Arsenic ion implantation, in the suitable range for sub-100nm CMOS technology.<\/span><\/p>\n<p>The International Technology Roadmap for Semiconductors (ed. 1999) underlines the need for development of analytical models for ion implantation simulations, supported by Monte Carlo code. These models become more and more complex, from the simple Gaussian approximations to the latest double Pearson-4 distributions [1], or Legendre polynomials fitting [2].<\/p>\n<p><img loading=\"lazy\" width=\"1286\" height=\"1669\" src=\"https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2.jpg\" class=\"cleaned-enfold-image\" alt=\"\" decoding=\"async\" loading=\"lazy\" srcset=\"https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2.jpg 1286w, https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2-231x300.jpg 231w, https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2-794x1030.jpg 794w, https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2-768x997.jpg 768w, https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2-1184x1536.jpg 1184w, https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2-1156x1500.jpg 1156w, https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2-543x705.jpg 543w, https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2-29x37.jpg 29w, https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2-42x55.jpg 42w, https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2-37x48.jpg 37w\" sizes=\"auto, (max-width: 1286px) 100vw, 1286px\" \/><\/p>\n<p><a href=\"https:\/\/silvaco.com\/dynamicweb\/jsp\/downloads\/DownloadDocStepsAction.do?req=download&#038;nm=simstd_may_2000_a2.pdf\" class=\"BGT-btn\" target=\"_blank\" rel=\"noopener noreferrer\">Download Simulation Standard<\/a><\/p>\n","protected":false},"excerpt":{"rendered":"<p>This article will present an efficient and original methodology for global and predictive modeling of low energy Boron, BF2 and Arsenic ion implantation, in the suitable range for sub-100nm CMOS technology.<\/p>\n","protected":false},"author":12,"featured_media":22148,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"inline_featured_image":false,"footnotes":""},"categories":[7570],"tags":[],"class_list":["post-29594","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-simulation-standard","entry","has-media"],"yoast_head":"<!-- This site is optimized with the Yoast SEO Premium plugin v28.7 (Yoast SEO v28.7) - https:\/\/yoast.com\/product\/yoast-seo-premium-wordpress\/ -->\n<title>Calibrated and Predictive Simulation of Doping Profiles: Low Energy As, B and BF2 Ion Implantation - Silvaco<\/title>\n<meta name=\"description\" content=\"This article will present an efficient and original methodology for global and predictive modeling of low energy Boron, BF2 and Arsenic ion implantation, in the suitable range for sub-100nm CMOS technology.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/\" \/>\n<meta property=\"og:locale\" content=\"ja_JP\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Calibrated and Predictive Simulation of Doping Profiles: Low Energy As, B and BF2 Ion Implantation\" \/>\n<meta property=\"og:description\" content=\"This article will present an efficient and original methodology for global and predictive modeling of low energy Boron, BF2 and Arsenic ion implantation, in the suitable range for sub-100nm CMOS technology.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/\" \/>\n<meta property=\"og:site_name\" content=\"Silvaco\" \/>\n<meta property=\"article:publisher\" content=\"https:\/\/www.facebook.com\/SilvacoSoftware\/\" \/>\n<meta property=\"article:published_time\" content=\"2000-05-02T16:00:43+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2026-10-15T21:37:20+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2.jpg\" \/>\n\t<meta property=\"og:image:width\" content=\"1286\" \/>\n\t<meta property=\"og:image:height\" content=\"1669\" \/>\n\t<meta property=\"og:image:type\" content=\"image\/jpeg\" \/>\n<meta name=\"author\" content=\"Casey Molver\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:creator\" content=\"@SilvacoSoftware\" \/>\n<meta name=\"twitter:site\" content=\"@SilvacoSoftware\" \/>\n<meta name=\"twitter:label1\" content=\"\u57f7\u7b46\u8005\" \/>\n\t<meta name=\"twitter:data1\" content=\"Casey Molver\" \/>\n\t<meta name=\"twitter:label2\" content=\"\u63a8\u5b9a\u8aad\u307f\u53d6\u308a\u6642\u9593\" \/>\n\t<meta name=\"twitter:data2\" content=\"1 minute\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\\\/\\\/schema.org\",\"@graph\":[{\"@type\":\"Article\",\"@id\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/simulation-standard\\\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\\\/#article\",\"isPartOf\":{\"@id\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/simulation-standard\\\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\\\/\"},\"author\":{\"name\":\"Casey Molver\",\"@id\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/#\\\/schema\\\/person\\\/2763eb741ca5ac04477fdff50ed84c80\"},\"headline\":\"Calibrated and Predictive Simulation of Doping Profiles: Low Energy As, B and BF2 Ion Implantation\",\"datePublished\":\"2000-05-02T16:00:43+00:00\",\"dateModified\":\"2026-10-15T21:37:20+00:00\",\"mainEntityOfPage\":{\"@id\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/simulation-standard\\\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\\\/\"},\"wordCount\":125,\"image\":{\"@id\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/simulation-standard\\\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\\\/#primaryimage\"},\"thumbnailUrl\":\"https:\\\/\\\/silvaco.com\\\/wp-content\\\/uploads\\\/simulationstandard\\\/simstd_may_2000_a2.jpg\",\"articleSection\":[\"Simulation Standard\"],\"inLanguage\":\"ja\"},{\"@type\":\"WebPage\",\"@id\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/simulation-standard\\\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\\\/\",\"url\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/simulation-standard\\\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\\\/\",\"name\":\"Calibrated and Predictive Simulation of Doping Profiles: Low Energy As, B and BF2 Ion Implantation - Silvaco\",\"isPartOf\":{\"@id\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/#website\"},\"primaryImageOfPage\":{\"@id\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/simulation-standard\\\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\\\/#primaryimage\"},\"image\":{\"@id\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/simulation-standard\\\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\\\/#primaryimage\"},\"thumbnailUrl\":\"https:\\\/\\\/silvaco.com\\\/wp-content\\\/uploads\\\/simulationstandard\\\/simstd_may_2000_a2.jpg\",\"datePublished\":\"2000-05-02T16:00:43+00:00\",\"dateModified\":\"2026-10-15T21:37:20+00:00\",\"author\":{\"@id\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/#\\\/schema\\\/person\\\/2763eb741ca5ac04477fdff50ed84c80\"},\"description\":\"This article will present an efficient and original methodology for global and predictive modeling of low energy Boron, BF2 and Arsenic ion implantation, in the suitable range for sub-100nm CMOS technology.\",\"breadcrumb\":{\"@id\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/simulation-standard\\\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\\\/#breadcrumb\"},\"inLanguage\":\"ja\",\"potentialAction\":[{\"@type\":\"ReadAction\",\"target\":[\"https:\\\/\\\/silvaco.com\\\/ja\\\/simulation-standard\\\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\\\/\"]}]},{\"@type\":\"ImageObject\",\"inLanguage\":\"ja\",\"@id\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/simulation-standard\\\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\\\/#primaryimage\",\"url\":\"https:\\\/\\\/silvaco.com\\\/wp-content\\\/uploads\\\/simulationstandard\\\/simstd_may_2000_a2.jpg\",\"contentUrl\":\"https:\\\/\\\/silvaco.com\\\/wp-content\\\/uploads\\\/simulationstandard\\\/simstd_may_2000_a2.jpg\",\"width\":1286,\"height\":1669},{\"@type\":\"BreadcrumbList\",\"@id\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/simulation-standard\\\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\\\/#breadcrumb\",\"itemListElement\":[{\"@type\":\"ListItem\",\"position\":1,\"name\":\"Home\",\"item\":\"https:\\\/\\\/silvaco.com\\\/zh-hans\\\/%e9%a6%96%e9%a1%b5\\\/\"},{\"@type\":\"ListItem\",\"position\":2,\"name\":\"Calibrated and Predictive Simulation of Doping Profiles: Low Energy As, B and BF2 Ion Implantation\"}]},{\"@type\":\"WebSite\",\"@id\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/#website\",\"url\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/\",\"name\":\"Silvaco\",\"description\":\"\",\"potentialAction\":[{\"@type\":\"SearchAction\",\"target\":{\"@type\":\"EntryPoint\",\"urlTemplate\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/?s={search_term_string}\"},\"query-input\":{\"@type\":\"PropertyValueSpecification\",\"valueRequired\":true,\"valueName\":\"search_term_string\"}}],\"inLanguage\":\"ja\"},{\"@type\":\"Person\",\"@id\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/#\\\/schema\\\/person\\\/2763eb741ca5ac04477fdff50ed84c80\",\"name\":\"Casey Molver\",\"image\":{\"@type\":\"ImageObject\",\"inLanguage\":\"ja\",\"@id\":\"https:\\\/\\\/secure.gravatar.com\\\/avatar\\\/3dba2e48e0c4a977ea23fa75d38750a7763843df78307070478340a2517b8d6b?s=96&d=blank&r=g\",\"url\":\"https:\\\/\\\/secure.gravatar.com\\\/avatar\\\/3dba2e48e0c4a977ea23fa75d38750a7763843df78307070478340a2517b8d6b?s=96&d=blank&r=g\",\"contentUrl\":\"https:\\\/\\\/secure.gravatar.com\\\/avatar\\\/3dba2e48e0c4a977ea23fa75d38750a7763843df78307070478340a2517b8d6b?s=96&d=blank&r=g\",\"caption\":\"Casey Molver\"},\"url\":\"https:\\\/\\\/silvaco.com\\\/ja\\\/author\\\/caseym\\\/\"}]}<\/script>\n<!-- \/ Yoast SEO Premium plugin. -->","yoast_head_json":{"title":"Calibrated and Predictive Simulation of Doping Profiles: Low Energy As, B and BF2 Ion Implantation - Silvaco","description":"This article will present an efficient and original methodology for global and predictive modeling of low energy Boron, BF2 and Arsenic ion implantation, in the suitable range for sub-100nm CMOS technology.","robots":{"index":"index","follow":"follow","max-snippet":"max-snippet:-1","max-image-preview":"max-image-preview:large","max-video-preview":"max-video-preview:-1"},"canonical":"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/","og_locale":"ja_JP","og_type":"article","og_title":"Calibrated and Predictive Simulation of Doping Profiles: Low Energy As, B and BF2 Ion Implantation","og_description":"This article will present an efficient and original methodology for global and predictive modeling of low energy Boron, BF2 and Arsenic ion implantation, in the suitable range for sub-100nm CMOS technology.","og_url":"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/","og_site_name":"Silvaco","article_publisher":"https:\/\/www.facebook.com\/SilvacoSoftware\/","article_published_time":"2000-05-02T16:00:43+00:00","article_modified_time":"2026-10-15T21:37:20+00:00","og_image":[{"width":1286,"height":1669,"url":"https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2.jpg","type":"image\/jpeg"}],"author":"Casey Molver","twitter_card":"summary_large_image","twitter_creator":"@SilvacoSoftware","twitter_site":"@SilvacoSoftware","twitter_misc":{"\u57f7\u7b46\u8005":"Casey Molver","\u63a8\u5b9a\u8aad\u307f\u53d6\u308a\u6642\u9593":"1 minute"},"schema":{"@context":"https:\/\/schema.org","@graph":[{"@type":"Article","@id":"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/#article","isPartOf":{"@id":"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/"},"author":{"name":"Casey Molver","@id":"https:\/\/silvaco.com\/ja\/#\/schema\/person\/2763eb741ca5ac04477fdff50ed84c80"},"headline":"Calibrated and Predictive Simulation of Doping Profiles: Low Energy As, B and BF2 Ion Implantation","datePublished":"2000-05-02T16:00:43+00:00","dateModified":"2026-10-15T21:37:20+00:00","mainEntityOfPage":{"@id":"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/"},"wordCount":125,"image":{"@id":"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/#primaryimage"},"thumbnailUrl":"https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2.jpg","articleSection":["Simulation Standard"],"inLanguage":"ja"},{"@type":"WebPage","@id":"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/","url":"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/","name":"Calibrated and Predictive Simulation of Doping Profiles: Low Energy As, B and BF2 Ion Implantation - Silvaco","isPartOf":{"@id":"https:\/\/silvaco.com\/ja\/#website"},"primaryImageOfPage":{"@id":"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/#primaryimage"},"image":{"@id":"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/#primaryimage"},"thumbnailUrl":"https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2.jpg","datePublished":"2000-05-02T16:00:43+00:00","dateModified":"2026-10-15T21:37:20+00:00","author":{"@id":"https:\/\/silvaco.com\/ja\/#\/schema\/person\/2763eb741ca5ac04477fdff50ed84c80"},"description":"This article will present an efficient and original methodology for global and predictive modeling of low energy Boron, BF2 and Arsenic ion implantation, in the suitable range for sub-100nm CMOS technology.","breadcrumb":{"@id":"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/#breadcrumb"},"inLanguage":"ja","potentialAction":[{"@type":"ReadAction","target":["https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/"]}]},{"@type":"ImageObject","inLanguage":"ja","@id":"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/#primaryimage","url":"https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2.jpg","contentUrl":"https:\/\/silvaco.com\/wp-content\/uploads\/simulationstandard\/simstd_may_2000_a2.jpg","width":1286,"height":1669},{"@type":"BreadcrumbList","@id":"https:\/\/silvaco.com\/ja\/simulation-standard\/calibrated-and-predictive-simulation-of-doping-profiles-low-energy-as-b-and-bf2-ion-implantation\/#breadcrumb","itemListElement":[{"@type":"ListItem","position":1,"name":"Home","item":"https:\/\/silvaco.com\/zh-hans\/%e9%a6%96%e9%a1%b5\/"},{"@type":"ListItem","position":2,"name":"Calibrated and Predictive Simulation of Doping Profiles: Low Energy As, B and BF2 Ion Implantation"}]},{"@type":"WebSite","@id":"https:\/\/silvaco.com\/ja\/#website","url":"https:\/\/silvaco.com\/ja\/","name":"Silvaco","description":"","potentialAction":[{"@type":"SearchAction","target":{"@type":"EntryPoint","urlTemplate":"https:\/\/silvaco.com\/ja\/?s={search_term_string}"},"query-input":{"@type":"PropertyValueSpecification","valueRequired":true,"valueName":"search_term_string"}}],"inLanguage":"ja"},{"@type":"Person","@id":"https:\/\/silvaco.com\/ja\/#\/schema\/person\/2763eb741ca5ac04477fdff50ed84c80","name":"Casey Molver","image":{"@type":"ImageObject","inLanguage":"ja","@id":"https:\/\/secure.gravatar.com\/avatar\/3dba2e48e0c4a977ea23fa75d38750a7763843df78307070478340a2517b8d6b?s=96&d=blank&r=g","url":"https:\/\/secure.gravatar.com\/avatar\/3dba2e48e0c4a977ea23fa75d38750a7763843df78307070478340a2517b8d6b?s=96&d=blank&r=g","contentUrl":"https:\/\/secure.gravatar.com\/avatar\/3dba2e48e0c4a977ea23fa75d38750a7763843df78307070478340a2517b8d6b?s=96&d=blank&r=g","caption":"Casey Molver"},"url":"https:\/\/silvaco.com\/ja\/author\/caseym\/"}]}},"_links":{"self":[{"href":"https:\/\/silvaco.com\/ja\/wp-json\/wp\/v2\/posts\/29594","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/silvaco.com\/ja\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/silvaco.com\/ja\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/silvaco.com\/ja\/wp-json\/wp\/v2\/users\/12"}],"replies":[{"embeddable":true,"href":"https:\/\/silvaco.com\/ja\/wp-json\/wp\/v2\/comments?post=29594"}],"version-history":[{"count":2,"href":"https:\/\/silvaco.com\/ja\/wp-json\/wp\/v2\/posts\/29594\/revisions"}],"predecessor-version":[{"id":956102,"href":"https:\/\/silvaco.com\/ja\/wp-json\/wp\/v2\/posts\/29594\/revisions\/956102"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/silvaco.com\/ja\/wp-json\/wp\/v2\/media\/22148"}],"wp:attachment":[{"href":"https:\/\/silvaco.com\/ja\/wp-json\/wp\/v2\/media?parent=29594"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/silvaco.com\/ja\/wp-json\/wp\/v2\/categories?post=29594"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/silvaco.com\/ja\/wp-json\/wp\/v2\/tags?post=29594"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}