• Simulation Standard Technical Journal

Simulation Standard Technical Journal

A Journal for Process and Device Engineers

Optoelectric Device Simulation of a Dual-Base BJT Using Luminous

With the continuing emergence of optical technologies, optoelectronic device structures are becoming increasingly important for modern telecommunications and data network applications. Like other semiconductor technologies, two-dimensional numerical simulation can be an invaluable tool for studying and understanding semiconductor device behavior in response to optical stimulation. This article seeks to demonstrate the simulation of optoelectric device structures using Luminous.

The Industry Standard of SOI Technology From Process To Circuit Simulation

SOI technology for state of the art CMOS technology is rapidly approaching maturity. PD-SOI device design has the advantage of easier manufacturing but requires more sophisticated device and circuit design to reduce the effects of the floating-body. FD-SOI device design potentially has the advantage of no floating-body effects but requires very thin silicon films making manufacturing more challenging. As a consequence the optimization of SOI device design requires a coupled solution where both process and circuit simulation can be tied together. Silvaco provides a complete, well integrated simulation software for all aspects of SOI technology. Our SOI specific software includes technology simulation, SPICE model extraction, interconnect parasitic analysis, SPICE circuit simulation and traditional CAD. The TCAD Driven CAD approach provides the most accurate models for both device engineers and circuit designers.

Hints & Tips October 1999

A. It is likely that there may be some contact problems or defected devices during the data collection. This problem can occur when the log file is open and some good device data has already been stored in the log file. Then it becomes a time consuming process to close the log file, deselect the good devices from the device strategy screen, append the log file and re-measure the device which created the problem.

New Improvements in TFT Models: Amorphous (Level=35) and Poly-Silicon (Level=36) TFT

New improvements have been added to Shur models. These enhancements include a self-heating effect and a new charge conservative model.

BSIM3SOI Version 2.1 (FD, DD and PD) Models Released in SmartSpice

The Berkeley BSIM3SOI version 2.1 models, released in September 1999, have been implemented in SmartSpice. The three new models are selected according to LEVEL selector.

Hints & Tips September 1999

Q: How can I cut exactly the same hole in many layers? A: There are at least two ways to do this. (1) You may use the command Tools>>Cut by Line as follows.