Advanced Layout Editing Using XI-scripts

Introduction

To provide uniform etching of metal, dummy metal rectangles can be placed over an unused area of the chip. The following script generates dummy layer with a full array of metal rectangles over the whole cell area. It calls DRC script <dummy.dsf> which sizes the real metal layout up by 2 µm and subtracts it from the dummy layer. Then the dummy layer sized up and down to remove any slivers left over from the subtraction phase.