エントリー - Gigi Boss
2024 TCAD Baseline Release
- Section 1: Process Simulation – New Features in 2024 Baseline Release
- Section 2: Device Simulation – New Features in 2024 Baseline Release
- Section 3: Victory DoE – New Features in 2024 Baseline Release
Silvaco Reports Second Quarter 2024 Financial Results
August 7, 2024
Applying Artificial Intelligence in Fab Technology Co-Optimization (FTCO™)
2024/7/25
本ウェビナーで説明する新しいアプローチは、現在すでに実生産で使用されており、人工知能（AI）と機械学習（ML）を活用して製造工程の正確なモデルを生成します。このアプローチでは、実際の物理学と化学を考慮した製造工程のTCADデジタル・モデル（デジタル・ツイン）を使用します。
Silvaco Reports First Quarter 2024 Financial Results
June 20, 2024
How Can I Re-Use Individual Monte-Carlo 3D Implant Profiles?
It is often the case that a design of experiments (DOE) is required to optimize the performance of a particular device. Sometimes this simply means tweaking the implant dose for threshold voltage or other minor adjustments, but in other cases it can mean tweaking such things as high energy deep well implants.
Join Silvaco at DAC 2024
May 30, 2024
Comparison of Models for Fluorine Effect on Dopant Diffusion in CMOS Processes
Recently a new diffusion model was introduced to Victory Process: the CMOS model. This model aims at taking on the challenges brought by the specificities of CMOS device processing such as steep temperature ramps, short annealings or shallow implantations.