エントリー - Gigi Boss

Setting up the Wafer Orientation: Applications to Ion Implantation

Properly setting the wafer orientation in Victory Process (VP) is critical for various processes such as ion implantation, etching, and deposition. For ion implantation in particular, the determination of the wafer orientation becomes crucial, given its profound impact on profile variations in channeling and non-channeling directions.

Optoelectronic Component Design for Photonic Integrated Circuits

Photonic integrated circuits (PICs) are a key enabling technology for a broad range of current and next-generation products. Combining semiconductor materials and manufacturing processes common to microelectronics with the encoding, transmission and detection of light, PICs are transforming communication in datacenters by bringing bandwidth closer to compute cores, and are accelerating emerging applications like LiDAR for autonomy and quantum computing for the future of information processing.

Learn How STMicroelectronics Silicon Carbide (SiC) Research Team uses Silvaco TCAD to Analyze the Impact of Surface Defect Dot on Short Circuit Phenomena in SiC Devices

2024/3/28
シルバコ・ソフトウェアを用いたTCADシミュレーションにより、活性領域に局在する欠陥の短絡現象への影響を調査しました。欠陥ドットが平坦なボディ/ドレイン界面、チャネル領域のSiC/酸化膜界面、湾曲したボディ/ドレイン界面に局在するさまざまなケースを検討し、位置に対する感度も調査しました。

Advanced TCAD Modeling of HfO2-based ReRAM: Coupling Redox Reactions and Thermal Effects

This paper presents a TCAD modeling approach for HfO2-based ReRAM (Resistive Random Access Memory). For describing the switching and retention behaviors of a ReRAM cell, the proposed model includes the essential redox reactions coupled to an electron transport model and to heat generation. The effects of various parameters such as sweep time, and device geometry on the switching behavior are investigated. Simulation results demonstrate that thermal management is crucial both for the reliable operation of ReRAM cells and retention. The proposed TCAD model provides insight into the design and optimization of HfO2-based ReRAM devices.

シルバコ、欧州のワイドバンドギャップ半導体イノベーション・エコシステムであるGaN Valley™に参加

2024年1月29日
効率的な窒化ガリウム(GaN)パワー・デバイス設計の最先端技術の発展と、Victory TCADプラットフォームによる顧客の技術革新を支援するため、GaN Valley™に参加したことを発表しました。

GaN-based Power Devices Design and Development with Silvaco TCAD Solution

2024/2/29
物理ベースのシミュレーション・ツールは、FBH研究室におけるこれらの新世代ワイドバンドギャップ電子デバイスの開発と洞察に不可欠です。このウェビナーでは、縦型および横型GaNベース・パワー・デバイスの設計、予測、電気特性の解析に使用するシルバコ・シミュレーション・ツールの使用例を紹介します。

Numerical Algorithm to Perform Viscoelastic Analysis

Numerical Algorithm to Perform Viscoelastic Analysis

Viscous materials exhibit both viscous and elastic characteristics when undergoing deformation. The response of such materials to force is characterized by two distinct phases. The materials first deform instantaneously akin to elastic materials. Following on, the material continues to deform at a relatively slower time scale. Typically, materials undergoing thermal treatment exhibit viscoelastic properties.