• TCAD Examples

anopex03.in : Planar Lithography with Phase Shift Masks

Requires: SSuprem 4/Optolith
Minimum Versions: Athena 5.22.3.R

This example shows lithography with phase shift masks. The aerial image is calculated for a 0.3 um contact hole and a 0.3 contact hole with sub-imageable (0.1 um) 180 degree phase shift outriggers. The use of phase-shifters results in twice double intensity in the center of the whole (see the first TonyPlot). Consequently, only the use of phase-shifting technique allows to achieve desirable CD, while the sample without phase-shifters remains underdeveloped.

To load and run this example, select the Load button in DeckBuild > Examples. This will copy the input file and any support files to your current working directory. Select the Run button in DeckBuild to execute the example.

Input Files
Output Results
These examples are for reference only. Every software package contains a full set of examples suitable for that version and are installed with the software. If you see examples here that are not in your installation you should consider updating to a later version of the software.
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