anopex22.in : Optimization of Phase Shift Mask
Requires: SSuprem 4/Optolith
Minimum Versions: Athena 5.22.3.R
This example uses the looping capability of DBInternal for optimization of sub-imageable ( < 0.12 um) 180 degree phase shift outriggers. The example is based on example anopex03.in. The maximum intensity is extracted as a function of two parameters: the distance of the shifters from center of the contact hole mask and width of the shifters. The final hole structures are shown for all 15 conditions simulated.
To load and run this example, select the Load button in DeckBuild > Examples. This will copy the input file and any support files to your current working directory. Select the Run button in DeckBuild to execute the example.
Input Files
Input Deck
go internal set example=anopex22 load infile=$"example"_tmpl.in save type=sdb outfile=$"example".dat sweep parameter=dist type=linear range="0.32, 0.52, 5" \ parameter=width type=linear range="0.04, 0.12, 3" tonyplot $"example"*.str -set $"example".set tonyplot $"example".dat -set $"example"_dat.set quit ################# Content of anopex22_tmpl.in file ######################################## # go athena # # Mask layout: 0.3 um contact hole and 0.3 contact hole # with sub-imageable (0.04 - 0.12 um) 180 degree Phase Shifters (outriggers). # # line x loc=-0.6 spac=0.1 # line x loc=-0.15 spac=0.01 # line x loc=0 spac=0.1 # line x loc=0.15 spac=0.01 # line x loc=0.6 spac=0.1 # line y loc=1.1 spac=0.5 # line y loc=1.6 spac=0.5 # init silicon # rate.develop name.resist= OiR32 i.line c.dill=0.026 # # deposit nitride thick=0.035 # deposit name.resist=OiR32 thick=.8 divisions=30 # Aerial image calculation # # illumination i.line # illum.filter clear.fil circle sigma=0.38 # projection na=.54 # pupil.filter clear.fil circle # # set dist=0.3 # set width=0.1 # layout lay.clear x.lo=-0.15 z.lo=-0.15 x.hi=0.15 z.hi=0.15 phase=0. trans=1. # layout x.lo=-$dist z.lo=$dist x.hi=$dist z.hi=($dist+$width) phase=180. trans=1. # layout x.lo=-$dist z.lo=-($dist+$width) x.hi=$dist z.hi=-$dist phase=180. trans=1. # layout x.lo=-($dist+$width) z.lo=-$dist x.hi=-$dist z.hi=$dist phase=180. trans=1. # layout x.lo=$dist z.lo=-$dist x.hi=($dist+$width) z.hi=$dist phase=180. trans=1. # # image win.x.lo=-0.75 win.x.hi=0.75 win.z.lo=0 win.z.hi=0 dx=0.01 # # structure outfile=anopex03_int.str intensity # # extract init inf="anopex03_int.str" # extract name="peak" 2d.max.conc impurity="Norm Intensity" material="All" # # expose dose=230 num.refl=10 # bake time=45 seconds temp=115 # develop mack time=60 steps=4 substeps=30 # # structure outfile=anopex22_w$"width"d$"dist".str ############################################################################################
Output Results
These examples are for reference only. Every software package contains a full set of examples suitable for that version and are installed with the software. If you see examples here that are not in your installation
you should consider updating to a later version of the software.