Non-planar Lithography : Non-planar Lithography

Requires: SSuprem 4/Optolith
Minimum Versions: Athena 5.22.3.R

This example shows non-planar lithography. The effects of exposing photoresist over a change in topography are demonstrated. The example uses a user defined aerial image cross section. The intensity data are read from the file anopex19.exp. The photoresist is developed, and the effects of the light reflected off of the 45 degree slope can be seen.

To load and run this example, select the Load button in DeckBuild > Examples. This will copy the input file and any support files to your current working directory. Select the Run button in DeckBuild to execute the example.