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aniiex03.in : Screen Oxide Thickness Dependence using the SVDP Model
Requires: SSUPREM4 Minimum Versions: ATHENA 5.20.0.R
This example shows how a 35 keV boron implant profile depends on the thickness of the surface oxide. Oxide is grown in DRY ambient at a temperature of 900 C. Oxidation time varies from 0 to 160 minutes which results in oxide thicknesses between approximately 50 and 400 Angstroms. The values of oxide thickness are extracted and then substituted into the S.OXIDEparameter of the IMPLANTstatement. The surface screen oxide partially randomizes the ion flux which leads to less channeling with increasing oxide thickness. The SIMS Verified Dual Pearson ( SVDP) method allows us to properly predict this effect. Parameter PRINT.MOMspecifies that moments used in each simulation should be printed out.
To load and run this example, select the Load example button. This action will copy all associated files to your current working directory. Select the DeckBuild run button to execute the example.