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aniiex18.in : Effect of Implant Steps Sequence.
Requires: SSUPREM4, MC IMPLANT Minimum Versions: ATHENA 5.20.0.R
This example demonstrates that not only the profile depth but also details of the 2D shape depends on the sequence of implant steps. In the first case even a low dose As implant partially disorders silicon near the surface which results in a higher probability of channeling in secondary directions. In the second case, channeling takes place predominantly in the normal direction.
To load and run this example, select the Load example button. This action will copy all associated files to your current working directory. Select the DeckBuild run button to execute the example.