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aniiex18.in : Effect of Implant Steps Sequence.

Requires: SSUPREM4, MC IMPLANT Minimum Versions: ATHENA 5.20.0.R

This example demonstrates that not only the profile depth but also details of the 2D shape depends on the sequence of implant steps. In the first case even a low dose As implant partially disorders silicon near the surface which results in a higher probability of channeling in secondary directions. In the second case, channeling takes place predominantly in the normal direction.

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