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These examples are for reference only. Every software package contains a full set of examples suitable for that version and are installed with the software. If you see examples here that are not in your installation you should consider updating to a later version of the software.
anelex34.in : Polymer Etch Rate and Reflection Effect
Requires: Elite, MC DEPOSIT/ETCH
This example is similar to anelex33.in. It demonstrates how the characteristics of redeposited polymer affect the etching efficiency and shape of an etched trench.
The effect of polymer redeposition could be increased either by decreasing polymer etch rate (parameters MC.ETCH1 and MC.ETCH2) or by decreasing polymer particle reflection from the polymer layer (parameter MC.PLM.ALB)
The resulting plot shows that in both cases trench becomes shallower and narrower.
To load and run this example, select the Load example button. This action will copy all associated files to your current working directory. Select the DeckBuild run button to execute the example.