go VictoryProcess

## Process Description ##

Init Layout=clex05.lay Material=Silicon Depth=1

Deposit Material=Oxide Thickness=0.5 Max

Deposit Material=Aluminum Thickness=0.58 Max

Etch Material=Aluminum Mask=M1

Electrodes Mask=M1 Material=Aluminum

Deposit Material=Oxide Thickness=0.5 Max

Save Name=clex05_0

## Parasitic Extraction ##

go Clever

Init Structure="clex05_0.str"

Electrodes Substrate

Material Aluminum Conductivity=1e6

Interconnect Adapt=(0.04, 0.04)

Save Spice="clex05.net" Layout="clex05_1.lay"

quit