#####   3D MOS-FET SIMULATION WITH LOCAL INTER-COMNNECT   #####

go victoryprocess

init Layout=clex13.lay material=silicon Depth=1.0 gasheight=2 padding=3

option cartesian.spacing.on

cartesian mask=LOCOS spacing=0.1
cartesian mask=POLY  spacing=0.5
cartesian mask=CONT  spacing=0.2
cartesian mask=SD    spacing=0.5
cartesian mask=INT   spacing=0.5

## Pad oxide ##
Deposit material=Oxide Thickness=0.01 Max

## LOCOS ##
Deposit material=Nitride Thickness=0.1 Max 
Etch Material=Nitride Thickness=0.2 Max Mask=LOCOS
Oxidize thickness=0.572
Etch material=Nitride Max

## Gate ##
Deposit material=Polysilicon Thickness=0.2 conformal 
Etch Material=Polysilicon Max Mask=POLY

## Deposit Local Interconnect Oxide ##
Deposit material=Oxide Thickness=0.04 conformal
Etch Material=Oxide max Mask=OXIDE Reverse

## Deposit Local Interconnect ##
Deposit Material=TiNi Thickness=0.06 Conformal
Etch Material=TiNi Mask=INT

## Deposit BPSG ##
Deposit Material=BPSG Thickness=0.7 conformal 
Etch Material=BPSG Mask=CONT Reverse

## Source-Drain Contacts ##
Etch material=Oxide min Mask=CONT Reverse
Deposit material=Aluminum Thickness=0.4 conformal 
Etch Material=Aluminum Mask=SD
Electrodes mask=SD material=Aluminum

save name=clex13_0

## Create Mesh for Clever Extraction ##

go victorymesh
load in=clex13_0
remesh conformal
save out=clex13_3D.str mode=clever

## Parasitic Extraction ##

go clever

Init Layout="clex13.lay" structure="clex13_3D.str"

Material TitaniumNitride Conductivity=187000

Interconnect Resistance AdaptR=0.05

Save Spice="clex13.net"


#####   NOW DO A 2D CUTLINE AND PLOT IN 2D   #####

go clever

Init Layout="clex13.lay" structure="clex13_3D.str"

Cut line=(0, 13.5, 27, 13.5)

Save Structure="clex13_2D.str"

tonyplot clex13_2D.str